UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature

Byoung H. Lee; Sangho Cho; Jae K. Hwang; Su H. Kim; Myung M. Sung

doi:10.1016/j.tsf.2010.03.059

UV-enhanced atomic layer deposition of ZrO₂ thin films at room temperature

Byoung H. Lee, Sangho Cho, Jae K. Hwang, Su H. Kim, Myung M. Sung

Chemical Engineering & Materials Science

Research output: Contribution to journal › Article › peer-review

26 Scopus citations

Abstract

A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO₂ thin films on poly(ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H₂O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO₂ thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO₂ thin films with good adhesive strength on polymer substrates. The ZrO₂ thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties.

Original language	English
Pages (from-to)	6432-6436
Number of pages	5
Journal	Thin Solid Films
Volume	518
Issue number	22
DOIs	https://doi.org/10.1016/j.tsf.2010.03.059
State	Published - 1 Sep 2010

Keywords

Atomic layer deposition
PET
Self-limiting reaction
UV-ALD
ZrO

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10.1016/j.tsf.2010.03.059

Cite this

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title = "UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature",

abstract = "A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly(ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO2 thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO2 thin films with good adhesive strength on polymer substrates. The ZrO2 thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties.",

keywords = "Atomic layer deposition, PET, Self-limiting reaction, UV-ALD, ZrO",

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T1 - UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature

AU - Lee, Byoung H.

AU - Cho, Sangho

AU - Hwang, Jae K.

AU - Kim, Su H.

AU - Sung, Myung M.

PY - 2010/9/1

Y1 - 2010/9/1

N2 - A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly(ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO2 thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO2 thin films with good adhesive strength on polymer substrates. The ZrO2 thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties.

AB - A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly(ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO2 thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO2 thin films with good adhesive strength on polymer substrates. The ZrO2 thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties.

KW - Atomic layer deposition

KW - PET

KW - Self-limiting reaction

KW - UV-ALD

KW - ZrO

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