UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature

Byoung H. Lee, Sangho Cho, Jae K. Hwang, Su H. Kim, Myung M. Sung

Research output: Contribution to journalArticlepeer-review

26 Scopus citations


A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly(ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO2 thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO2 thin films with good adhesive strength on polymer substrates. The ZrO2 thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties.

Original languageEnglish
Pages (from-to)6432-6436
Number of pages5
JournalThin Solid Films
Issue number22
StatePublished - 1 Sep 2010


  • Atomic layer deposition
  • PET
  • Self-limiting reaction
  • UV-ALD
  • ZrO


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