Abstract
A UV-enhanced atomic layer deposition (UV-ALD) process was developed to deposit ZrO2 thin films on poly(ethylene terephthalate) (PET) polymer substrates using zirconium tetra-tert-butoxide (ZTB) and H2O as precursors with UV light. In the UV-ALD process, the surface reactions were found to be self-limiting and complementary enough to yield uniform, conformal, and pure ZrO2 thin films on polymer substrates at room temperature. The UV light was very effective to obtain the high-quality ZrO2 thin films with good adhesive strength on polymer substrates. The ZrO2 thin films exhibit large-scale uniformity, sharp interfaces, and unique electrical properties.
Original language | English |
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Pages (from-to) | 6432-6436 |
Number of pages | 5 |
Journal | Thin Solid Films |
Volume | 518 |
Issue number | 22 |
DOIs | |
State | Published - 1 Sep 2010 |
Keywords
- Atomic layer deposition
- PET
- Self-limiting reaction
- UV-ALD
- ZrO