Two-dimensional computational model for electrochemical micromachining with ultrashort voltages pulses

Jason A. Kenney, Gyeong S. Hwang

Research output: Contribution to conferencePaperpeer-review


We have developed a computational model to simulate electrochemical micromachining of conducting substrates with ultrashort voltage pulses. This theoretical approach integrates (i) a circuit model to describe charging and discharging of electrochemical double layers and electric field variation in electrolytes and (ii) the level set method to simulate feature profile evolution during electrochemical etching. Our simulation results of transient current responses and etch profile evolution are qualitatively in agreement with experimental observations. From our simulations, we find that the resolution of etched features is a strong function of the substrate double layer capacity which may be controlled by electrolyte concentration and pulse duration.

Original languageEnglish
Number of pages8
StatePublished - 2004
Event205th ECS Meeting - San Antonio, TX, United States
Duration: 9 May 200413 May 2004


Conference205th ECS Meeting
Country/TerritoryUnited States
CitySan Antonio, TX


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