Two-dimensional computational model for electrochemical micromachining with ultrashort voltage pulses

Jason A. Kenney, Gyeong S. Hwang, Woonsup Shin

Research output: Contribution to journalArticlepeer-review

38 Scopus citations

Abstract

The electrochemical micromachining of conducting materials with ultrashort voltage pulses was investigated. A two-dimensional computational model was developed for the simulation of the electrochemical process. For the approach, a circuit model and the level set method were integrated for describing charging and discharging of electrochemical double layers and electric field variation in electrolytes, and to simulate feature profile evolution during electrochemical etching, respectively. It was observed that the substrate double layer capacity greatly influenced the resolution of etched features.

Original languageEnglish
Pages (from-to)3774-3776
Number of pages3
JournalApplied Physics Letters
Volume84
Issue number19
DOIs
StatePublished - 10 May 2004

Fingerprint

Dive into the research topics of 'Two-dimensional computational model for electrochemical micromachining with ultrashort voltage pulses'. Together they form a unique fingerprint.

Cite this