Two-dimensional computational model for electrochemical micromachining with ultrashort voltage pulses

The electrochemical micromachining of conducting materials with ultrashort voltage pulses was investigated. A two-dimensional computational model was developed for the simulation of the electrochemical process. For the approach, a circuit model and the level set method were integrated for describing charging and discharging of electrochemical double layers and electric field variation in electrolytes, and to simulate feature profile evolution during electrochemical etching, respectively. It was observed that the substrate double layer capacity greatly influenced the resolution of etched features.