Topochemical limits for solid-state photoreactivity by fine tuning of the π-π interactions

Shi Yao Yang; Panče Naumov; Shunichi Fukuzumi

doi:10.1021/ja902094b

Topochemical limits for solid-state photoreactivity by fine tuning of the π-π interactions

Shi Yao Yang, Panče Naumov, Shunichi Fukuzumi

Department of Chemistry & Nanoscience

Research output: Contribution to journal › Article › peer-review

79 Scopus citations

Abstract

(Figure Presented) The limiting topochemical criteria for photodimerization were studied by modulation of the π-π stacking interactions between self-templating planar molecules with hydrogen bonding. The product yield and composition can be controlled predominantly by the distance between the reactive bonds.

Original language	English
Pages (from-to)	7247-7249
Number of pages	3
Journal	Journal of the American Chemical Society
Volume	131
Issue number	21
DOIs	https://doi.org/10.1021/ja902094b
State	Published - 3 Jun 2009

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title = "Topochemical limits for solid-state photoreactivity by fine tuning of the π-π interactions",

abstract = "(Figure Presented) The limiting topochemical criteria for photodimerization were studied by modulation of the π-π stacking interactions between self-templating planar molecules with hydrogen bonding. The product yield and composition can be controlled predominantly by the distance between the reactive bonds.",

author = "Yang, {Shi Yao} and Pan{\v c}e Naumov and Shunichi Fukuzumi",

year = "2009",

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AU - Yang, Shi Yao

AU - Naumov, Panče

AU - Fukuzumi, Shunichi

PY - 2009/6/3

Y1 - 2009/6/3

N2 - (Figure Presented) The limiting topochemical criteria for photodimerization were studied by modulation of the π-π stacking interactions between self-templating planar molecules with hydrogen bonding. The product yield and composition can be controlled predominantly by the distance between the reactive bonds.

AB - (Figure Presented) The limiting topochemical criteria for photodimerization were studied by modulation of the π-π stacking interactions between self-templating planar molecules with hydrogen bonding. The product yield and composition can be controlled predominantly by the distance between the reactive bonds.

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U2 - 10.1021/ja902094b

DO - 10.1021/ja902094b

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JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

IS - 21

ER -

Topochemical limits for solid-state photoreactivity by fine tuning of the π-π interactions

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