TY - GEN
T1 - Thin film diffusion barrier formation in PDMS microcavities
AU - Riaz, Asif
AU - Gandhiraman, Ram P.
AU - Dimov, Ivan K.
AU - Basabe-Desmonts, Lourdes
AU - Ricco, Antonio J.
AU - Ducrée, Jens
AU - Daniels, Stephen
AU - Lee, Luke P.
PY - 2009
Y1 - 2009
N2 - We describe a method to form glass like thin film barrier in polydimethylsiloxane (PDMS) microcavities. The reactive fragments for the surface reaction were created from O2 and hexamethyldisiloxane (HMDS) in RF plasma environment. The reaction is based on migration of the reactive fragments into the microcavities by diffusion, to form a glass like thin film barrier to conceal the naked surface of PDMS. The barrier successfully blocked penetration of a fluorescent dye rhodamine B (RhB) into PDMS. The thickness of the barrier could be controlled by the time of reaction and the pressure inside the reaction chamber. There is a wide range of applications of such a technique in various fields, e.g. for coating the covered surfaces of microfluidic channels, tubes, capillaries, medical devices, catheters, as well as chip-integrated capillary electrophoresis and advanced electronic and opto-fluidic packaging.
AB - We describe a method to form glass like thin film barrier in polydimethylsiloxane (PDMS) microcavities. The reactive fragments for the surface reaction were created from O2 and hexamethyldisiloxane (HMDS) in RF plasma environment. The reaction is based on migration of the reactive fragments into the microcavities by diffusion, to form a glass like thin film barrier to conceal the naked surface of PDMS. The barrier successfully blocked penetration of a fluorescent dye rhodamine B (RhB) into PDMS. The thickness of the barrier could be controlled by the time of reaction and the pressure inside the reaction chamber. There is a wide range of applications of such a technique in various fields, e.g. for coating the covered surfaces of microfluidic channels, tubes, capillaries, medical devices, catheters, as well as chip-integrated capillary electrophoresis and advanced electronic and opto-fluidic packaging.
KW - Diffusion barrier
KW - Hexamethyldisiloxane
KW - Microfluidics
KW - Plasma enhanced vapor deposition
KW - Polydimethylsiloxane
UR - http://www.scopus.com/inward/record.url?scp=71449091914&partnerID=8YFLogxK
U2 - 10.1109/SENSOR.2009.5285939
DO - 10.1109/SENSOR.2009.5285939
M3 - Conference contribution
AN - SCOPUS:71449091914
SN - 9781424441938
T3 - TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
SP - 1051
EP - 1054
BT - TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
T2 - TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems
Y2 - 21 June 2009 through 25 June 2009
ER -