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Thermal atomic layer etching of cobalt using plasma chlorination and chelation with hexafluoroacetylacetone
- Yongjae Kim
- , Somin Chae
- , Heeju Ha
- , Hyeongwu Lee
- , Sangheon Lee
- , Heeyeop Chae
Research output: Contribution to journal › Article › peer-review
12
Scopus
citations