Thermal atomic layer etching of cobalt using plasma chlorination and chelation with hexafluoroacetylacetone
- Yongjae Kim
- , Somin Chae
- , Heeju Ha
- , Hyeongwu Lee
- , Sangheon Lee
- , Heeyeop Chae
Research output: Contribution to journal › Article › peer-review
17
Scopus
citations