Surface nanostructuring by implantation of cluster ions

V. N. Popok, S. V. Prasalovich, E. E.B. Campbell

Research output: Contribution to journalConference articlepeer-review

21 Scopus citations

Abstract

A brief state-of-the-art review in the field of cluster ion implantation is presented. Ionised cluster beams are considered as a controllable and versatile tool for modification and processing of surfaces and near-surface layers on an atomistic scale as an alternative to ion implantation and ion-assisted deposition. The main effects occurring under cluster-surface collisions as well as advantages in the application of cluster ion beams are reviewed. The problem of surface erosion under impact of energetic cluster ions is emphasised in the paper. A model explaining crater and hillock formation on target surfaces with relation to the thermal-transfer effect and local target melting at the collision spot is discussed.

Original languageEnglish
Pages (from-to)265-272
Number of pages8
JournalVacuum
Volume76
Issue number2-3
DOIs
StatePublished - 5 Nov 2004
Event13th International School on Vacuum, Electron and Ion Technology - Varna, Bulgaria
Duration: 15 Sep 200319 Sep 2003

Keywords

  • Cluster ion implantation
  • Cluster-surface collision
  • Crater
  • Hillock

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