A brief state-of-the-art review in the field of cluster ion implantation is presented. Ionised cluster beams are considered as a controllable and versatile tool for modification and processing of surfaces and near-surface layers on an atomistic scale as an alternative to ion implantation and ion-assisted deposition. The main effects occurring under cluster-surface collisions as well as advantages in the application of cluster ion beams are reviewed. The problem of surface erosion under impact of energetic cluster ions is emphasised in the paper. A model explaining crater and hillock formation on target surfaces with relation to the thermal-transfer effect and local target melting at the collision spot is discussed.
|Number of pages||8|
|State||Published - 5 Nov 2004|
|Event||13th International School on Vacuum, Electron and Ion Technology - Varna, Bulgaria|
Duration: 15 Sep 2003 → 19 Sep 2003
- Cluster ion implantation
- Cluster-surface collision