TY - JOUR
T1 - Suppression of surface crystallization on borosilicate glass using RF plasma treatment
AU - Yoo, Sunghyun
AU - Ji, Chang Hyeon
AU - Jin, Joo Young
AU - Kim, Yong Kweon
N1 - Funding Information:
This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2012R1A1A2009547).
Publisher Copyright:
© 2014 Elsevier B.V. All rights reserved.
PY - 2014
Y1 - 2014
N2 - Surface crystallization on a commercial grade borosilicate glass wafer, Borofloat® 33, is effectively prevented against 3h of thermal reflow process at 850 °C. Surface plasma treatment with three different reactive gases, CF4, SF6, and Cl2, has been performed prior to the annealing. The effect of plasma treatment on surface ion concentration and nucleation of cristobalite were examined through optical microscope and x-ray photoemission spectroscopy. The dominant cause that suppresses crystallization was verified to be the increase of surface ion concentration of alumina during the plasma treatment. Both CF4 and SF6 treatment of no less than 30 s showed significant efficacy in suppressing crystallization by a factor of more than 112. Average surface roughness and the optical transparency were also enhanced by a factor of 15 and 3, respectively, compared to untreated sample.
AB - Surface crystallization on a commercial grade borosilicate glass wafer, Borofloat® 33, is effectively prevented against 3h of thermal reflow process at 850 °C. Surface plasma treatment with three different reactive gases, CF4, SF6, and Cl2, has been performed prior to the annealing. The effect of plasma treatment on surface ion concentration and nucleation of cristobalite were examined through optical microscope and x-ray photoemission spectroscopy. The dominant cause that suppresses crystallization was verified to be the increase of surface ion concentration of alumina during the plasma treatment. Both CF4 and SF6 treatment of no less than 30 s showed significant efficacy in suppressing crystallization by a factor of more than 112. Average surface roughness and the optical transparency were also enhanced by a factor of 15 and 3, respectively, compared to untreated sample.
KW - Borosilicate glass
KW - Micro-optical device
KW - Plasma treatment
KW - Surface crystallization
UR - http://www.scopus.com/inward/record.url?scp=84922513755&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2014.07.083
DO - 10.1016/j.apsusc.2014.07.083
M3 - Article
AN - SCOPUS:84922513755
SN - 0169-4332
VL - 316
SP - 484
EP - 490
JO - Applied Surface Science
JF - Applied Surface Science
IS - 1
ER -