Suppression of surface crystallization on borosilicate glass using RF plasma treatment

Sunghyun Yoo, Chang Hyeon Ji, Joo Young Jin, Yong Kweon Kim

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5 Scopus citations


Surface crystallization on a commercial grade borosilicate glass wafer, Borofloat® 33, is effectively prevented against 3h of thermal reflow process at 850 °C. Surface plasma treatment with three different reactive gases, CF4, SF6, and Cl2, has been performed prior to the annealing. The effect of plasma treatment on surface ion concentration and nucleation of cristobalite were examined through optical microscope and x-ray photoemission spectroscopy. The dominant cause that suppresses crystallization was verified to be the increase of surface ion concentration of alumina during the plasma treatment. Both CF4 and SF6 treatment of no less than 30 s showed significant efficacy in suppressing crystallization by a factor of more than 112. Average surface roughness and the optical transparency were also enhanced by a factor of 15 and 3, respectively, compared to untreated sample.

Original languageEnglish
Pages (from-to)484-490
Number of pages7
JournalApplied Surface Science
Issue number1
StatePublished - 2014

Bibliographical note

Funding Information:
This research was supported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2012R1A1A2009547).

Publisher Copyright:
© 2014 Elsevier B.V. All rights reserved.


  • Borosilicate glass
  • Micro-optical device
  • Plasma treatment
  • Surface crystallization


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