Superior and stable ferroelectric properties of hafnium-zirconium-oxide thin films deposited: Via atomic layer deposition using cyclopentadienyl-based precursors without annealing

Hyo Bae Kim, Moonyoung Jung, Youkyoung Oh, Seung Won Lee, Dongseok Suh, Ji Hoon Ahn

Research output: Contribution to journal › Article › peer-review

30 Scopus citations

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