Substrate doping concentration dependence of electron mobility using the effective deformation potential in uniaxial strained nMOSFETs

Wookyung Sun, Hyungsoon Shin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

The substrate doping concentration dependence of strain-enhanced electron mobility in nMOSFETs is investigated by using the effective deformation potential. The electron mobility model includes coulomb, intravalley phonon, intervalley phonon, and surface roughness scattering. The calculated results suggest that low substrate doping concentration on the (100)/<110> nMOSFETs should be advantageous for strain-induced electron mobility enhancement at high effective electric field.

Original languageEnglish
Title of host publication2013 IEEE International Conference of IEEE Region 10, IEEE TENCON 2013 - Conference Proceedings
DOIs
StatePublished - 2013
Event2013 IEEE International Conference of IEEE Region 10, IEEE TENCON 2013 - Xi'an, Shaanxi, China
Duration: 22 Oct 201325 Oct 2013

Publication series

NameIEEE Region 10 Annual International Conference, Proceedings/TENCON
ISSN (Print)2159-3442
ISSN (Electronic)2159-3450

Conference

Conference2013 IEEE International Conference of IEEE Region 10, IEEE TENCON 2013
Country/TerritoryChina
CityXi'an, Shaanxi
Period22/10/1325/10/13

Keywords

  • deformation potential
  • electron
  • mobility
  • phonon mobility
  • strain
  • stress
  • substrate doping concentration

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