Sub-Lithographic Patterning Technology for Nanowire Model Catalysts and DNA Label-Free Hybridization Detection

Yang Kyu Choi, Jeff Grunes, Joon Sung Lee, Ji Zhu, Gabor A. Somorjai, Luke P. Lee, Jeffrey Bokor

Research output: Contribution to journalConference articlepeer-review

4 Scopus citations


Sub-lithographic nanowires and nanogaps were fabricated by spacer lithography (size reduction technology), which is a parallel processes for nanometer pattern generation on a wafer scale with resolution comparable to the best electron beam lithography. Sub-10nm line width is defined by using a sacrificial ultra-thin film deposited by low pressure chemical vapor deposition (LPCVD), in a process similar to formation of gate sidewall spacers in CMOS processing. Furthermore, a novel method called iterative spacer lithography (ISL) is demonstrated by alternating materials and repeating the spacer lithography multiple times in order to multiply the pattern density. Silicon structures with sub-10nm width fabricated by this process were used as a mold in nanoimprint lithography and lift-off patterning of sub-30nm platinum nanowires for use as model catalyst systems. A similar process called reversed spacer lithography (RSL) is demonstrated to form sub-10nm nanogap device and fluid channels in poly-Si. This nanogap device provides a label-free tool for DNA hybridization detection based on measuring capacitance changes in the gap.

Original languageEnglish
Pages (from-to)10-19
Number of pages10
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 2003
EventNanofabrication Technologies - San Diego, CA, United States
Duration: 3 Aug 20034 Aug 2003


  • Iterative spacer lithography
  • Label free DNA hybridization detection
  • Nanofabrication
  • Nanogap
  • Nanowire
  • Platinum catalysts
  • Reversed spacer lithography
  • Sub-lithographic technology


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