Structure effects on resistive switching of A1/TiOχ/A1 devices for RRAM applications

Lee Eun Yu, Sungho Kim, Min Ki Ryu, Sung Yool Choi, Yang Kyu Choi

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97 Scopus citations

Abstract

Resistive switching characteristics are investigated for Al/TiOχ/Al devices, particularly for the structural effects in crossbar and via-hole-type devices. The via-hole structure shows more reliable switching characteristics than the crossbar structure, owing to the elimination of possible edge effects. The asymmetric switching behavior is analyzed with top Al/ TiOχ/Al and bottom Al/TiOχ/Al interfaces. A trap-controlled space-charge-limited-current model is proposed as a possible switching mechanism, and it is verified that switching mainly occurs on the top electrode/TiOχ interface side.

Original languageEnglish
Pages (from-to)331-333
Number of pages3
JournalIEEE Electron Device Letters
Volume29
Issue number4
DOIs
StatePublished - Apr 2008

Keywords

  • Crossbar structure
  • Metal-insulator-metal (MIM)
  • Resistance random access memory (RRAM)
  • Resistive switching
  • Space-charge-limited conduction
  • Via-hole structure

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