Abstract
Resistive switching characteristics are investigated for Al/TiOχ/Al devices, particularly for the structural effects in crossbar and via-hole-type devices. The via-hole structure shows more reliable switching characteristics than the crossbar structure, owing to the elimination of possible edge effects. The asymmetric switching behavior is analyzed with top Al/ TiOχ/Al and bottom Al/TiOχ/Al interfaces. A trap-controlled space-charge-limited-current model is proposed as a possible switching mechanism, and it is verified that switching mainly occurs on the top electrode/TiOχ interface side.
Original language | English |
---|---|
Pages (from-to) | 331-333 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 29 |
Issue number | 4 |
DOIs | |
State | Published - Apr 2008 |
Keywords
- Crossbar structure
- Metal-insulator-metal (MIM)
- Resistance random access memory (RRAM)
- Resistive switching
- Space-charge-limited conduction
- Via-hole structure