Structure and dynamics of silicon-oxygen pairs and their role in silicon self-diffusion in amorphous silica

Chin Lung Kuo, Sangheon Lee, Gyeong S. Hwang

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Abstract

Based on gradient corrected periodic density functional theory calculations, we present the formation, structure, and diffusion of SiO pairs in a -SiO2. We find that a SiO pair preferentially undergoes transformation into an O vacancy through a twofold-coordinated Si atom. We determine the pathways for SiO pair→divalent Si→O vacancy transformation and divalent Si diffusion, along with O vacancy diffusion. Based on these results, we also discuss how the presence of SiO pairs can enhance Si self-diffusion in a -SiO2.

Original languageEnglish
Article number054906
JournalJournal of Applied Physics
Volume104
Issue number5
DOIs
StatePublished - 2008

Bibliographical note

Funding Information:
We acknowledge the National Science Foundation (Grant Nos. CAREER-CTS-0449373 and ECS-0304026), the Semiconductor Research Corporation (Grant No. 1413-001), and the Robert A. Welch Foundation (Grant No. F-1535) for their financial support. We would also like to thank the Texas Advanced Computing Center for use of their computing resources.

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