Structural and leakage current behavior of Bi₄Ti₃O₁₂ thin films on La_0.5Sr_0.5CoO₃ bottom electrodes grown by pulsed laser deposition

Engineering & Materials Science

• Pulsed laser deposition 100%
• Leakage currents 69%
• Crystalline materials 67%
• Thin films 61%
• Electrodes 49%
• Microstructure 43%
• Heterojunctions 42%
• Diffraction 34%
• Aluminum oxide 31%
• X rays 29%
• Substrates 22%

Physics & Astronomy

• pulsed laser deposition 61%
• leakage 53%
• electrodes 40%
• microstructure 37%
• thin films 33%
• x ray diffraction 27%

Chemical Compounds

• Pulsed Laser Deposition 85%
• Leakage Current 85%
• Microstructure 43%
• Behavior as Electrode 32%