TY - JOUR
T1 - Stochastically Broken Inversion Symmetry of Van der Waals Topological Insulator for Nanoscale Physically Unclonable Functions
AU - Kim, Gunhyoung
AU - Lee, Jinhyoung
AU - Seok, Hyunho
AU - Kang, Taewoo
AU - Lee, Minyoung
AU - Choi, Hyunbin
AU - Son, Sihoon
AU - Cho, Jinill
AU - Lee, Dongho
AU - Son, Seowoo
AU - Hwang, Hosin
AU - Shin, Hyelim
AU - Han, Sujeong
AU - Woo, Gunhoo
AU - Ollier, Alexina
AU - Kim, Yeon Ji
AU - Fang, Lei
AU - Lee, Seunghwan
AU - Han, Gyuho
AU - Jung, Goo Eun
AU - Lee, Youngi
AU - Kim, Hyeong U.
AU - Park, Jungwon
AU - Heinrich, Andreas
AU - Jang, Won Jun
AU - Kwon, Seok Joon
AU - Kim, Taesung
N1 - Publisher Copyright:
© 2025 Wiley-VCH GmbH.
PY - 2025/4/2
Y1 - 2025/4/2
N2 - Owing to the exotic state of quantum matter, topological insulators have emerged as a significant platform for new-generation functional devices. Among these topological insulators, tetradymites have received significant attention because of their van der Waals (vdW) structures and inversion symmetries. Although this inversion symmetry completely blocks exotic quantum phenomena, it should be broken down to facilitate versatile topological functionalities. Recently, a Janus structure is suggested for asymmetric out-of-plane lattice structures, terminating the heterogeneous atoms at two sides of the vdW structure. However, the synthesis of Janus structures has not been achieved commercially because of the imprecise control of the layer-by-layer growth, high-temperature synthesis, and low yield. To overcome these limitations, plasma sulfurization of vdW topological insulators has been presented, enabling stochastic inversion asymmetry. To take practical advantage of the random lattice distortion, physically unclonable functions (PUFs) have been suggested as applications of vdW Janus topological insulators. The sulfur dominance is experimentally demonstrated via X-ray photoelectron spectroscopy, hysteresis variation, cross-sectional transmission electron microscopy, and adhesion energy variation. In conclusion, it is envisioned that the vdW Janus topological insulators can provide an extendable encryption platform for randomized lattice distortion, offering on-demand stochastic inversion asymmetry via a single-step plasma sulfurization.
AB - Owing to the exotic state of quantum matter, topological insulators have emerged as a significant platform for new-generation functional devices. Among these topological insulators, tetradymites have received significant attention because of their van der Waals (vdW) structures and inversion symmetries. Although this inversion symmetry completely blocks exotic quantum phenomena, it should be broken down to facilitate versatile topological functionalities. Recently, a Janus structure is suggested for asymmetric out-of-plane lattice structures, terminating the heterogeneous atoms at two sides of the vdW structure. However, the synthesis of Janus structures has not been achieved commercially because of the imprecise control of the layer-by-layer growth, high-temperature synthesis, and low yield. To overcome these limitations, plasma sulfurization of vdW topological insulators has been presented, enabling stochastic inversion asymmetry. To take practical advantage of the random lattice distortion, physically unclonable functions (PUFs) have been suggested as applications of vdW Janus topological insulators. The sulfur dominance is experimentally demonstrated via X-ray photoelectron spectroscopy, hysteresis variation, cross-sectional transmission electron microscopy, and adhesion energy variation. In conclusion, it is envisioned that the vdW Janus topological insulators can provide an extendable encryption platform for randomized lattice distortion, offering on-demand stochastic inversion asymmetry via a single-step plasma sulfurization.
KW - out-of-plane polarization
KW - physically unclonable functions
KW - piezoelectric force microscopy
KW - plasma sulfurization
KW - topological insulator
UR - http://www.scopus.com/inward/record.url?scp=105001644346&partnerID=8YFLogxK
U2 - 10.1002/adma.202419927
DO - 10.1002/adma.202419927
M3 - Article
C2 - 39967349
AN - SCOPUS:105001644346
SN - 0935-9648
VL - 37
JO - Advanced Materials
JF - Advanced Materials
IS - 13
M1 - 2419927
ER -