Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force

Jun Hui Park; Seongpil Hwang; Byung Kwon Kim; Juhyoun Kwak

doi:10.1016/j.elecom.2013.02.011

Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force

Jun Hui Park, Seongpil Hwang, Byung Kwon Kim, Juhyoun Kwak

Department of Chemistry & Nanoscience

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Herein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry.

Original language	English
Pages (from-to)	99-102
Number of pages	4
Journal	Electrochemistry Communications
Volume	30
DOIs	https://doi.org/10.1016/j.elecom.2013.02.011
State	Published - May 2013

Bibliographical note

Funding Information:
J. Kwak acknowledges support from the Nano/Bio Science & Technology Program ( 2010-0008213 ) of the Ministry of Education, Science and Technology, and the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2012-0000906 ). S. Hwang acknowledges support from the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2012R1A1A2006038 ).

Keywords

Colloidal lithography
Keywords
Magnetic microsphere
Microelectrodes array
Self-assembled monolayer
Swelling

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10.1016/j.elecom.2013.02.011

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@article{c0807d62877a40eaafebfb15964b1f7f,

title = "Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force",

abstract = "Herein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry.",

keywords = "Colloidal lithography, Keywords, Magnetic microsphere, Microelectrodes array, Self-assembled monolayer, Swelling",

author = "Park, {Jun Hui} and Seongpil Hwang and Kim, {Byung Kwon} and Juhyoun Kwak",

note = "Funding Information: J. Kwak acknowledges support from the Nano/Bio Science & Technology Program ( 2010-0008213 ) of the Ministry of Education, Science and Technology, and the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2012-0000906 ). S. Hwang acknowledges support from the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2012R1A1A2006038 ).",

year = "2013",

month = may,

doi = "10.1016/j.elecom.2013.02.011",

language = "English",

volume = "30",

pages = "99--102",

journal = "Electrochemistry Communications",

issn = "1388-2481",

publisher = "Elsevier Inc.",

}

TY - JOUR

T1 - Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force

AU - Park, Jun Hui

AU - Hwang, Seongpil

AU - Kim, Byung Kwon

AU - Kwak, Juhyoun

N1 - Funding Information: J. Kwak acknowledges support from the Nano/Bio Science & Technology Program ( 2010-0008213 ) of the Ministry of Education, Science and Technology, and the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2012-0000906 ). S. Hwang acknowledges support from the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology ( 2012R1A1A2006038 ).

PY - 2013/5

Y1 - 2013/5

N2 - Herein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry.

AB - Herein we report on pattern formation of a self-assembled monolayer (SAM) using soft colloidal lithography, based on strong physical contact between microspheres and substrate. In typical colloidal lithography, weak contact of microspheres with the substrate does not block the formation of a SAM. To establish conformal contact between microspheres and substrate to block the formation of a SAM, magnetic force was exerted on softened paramagnetic microspheres that had been swollen by a solvent. The soft colloidal lithography with controlled buoyance enables pattern formation through simple wet chemistry.

KW - Colloidal lithography

KW - Keywords

KW - Magnetic microsphere

KW - Microelectrodes array

KW - Self-assembled monolayer

KW - Swelling

UR - http://www.scopus.com/inward/record.url?scp=84874939889&partnerID=8YFLogxK

U2 - 10.1016/j.elecom.2013.02.011

DO - 10.1016/j.elecom.2013.02.011

M3 - Article

AN - SCOPUS:84874939889

SN - 1388-2481

VL - 30

SP - 99

EP - 102

JO - Electrochemistry Communications

JF - Electrochemistry Communications

ER -

Soft colloidal lithography by strong physical contact using swollen magnetic microspheres and magnetic force

Abstract

Bibliographical note

Keywords

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