Simulation of film growth contour in a narrow deep trench and film crystallinity in LPCVD process

Soon Hwang Gyeong; Burm Shin Chee; Heup Moon Sang

Simulation of film growth contour in a narrow deep trench and film crystallinity in LPCVD process

Soon Hwang Gyeong, Burm Shin Chee, Heup Moon Sang

Department of Chemical Engineering & Materials Science

Research output: Contribution to journal › Conference article › peer-review

Abstract

Deposition of a thin film in the LPCVD process has been simulated by a Monte-Carlo method based on a simple model taking into account the desorption, the surface reaction, and the surface migration of the film precursor. The model has been used for the simulation of the film profile obtained in a narrow and deep trench and of the film crystallinity on a flat surface. The simulation results describe successfully those obtained by experiments under various process conditions.

Original language	English
Pages (from-to)	125-130
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	389
State	Published - 1995
Event	Proceedings of the Spring Meeting on MRS - San Francisco, CA, USA Duration: 17 Apr 1995 → 20 Apr 1995

Cite this

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title = "Simulation of film growth contour in a narrow deep trench and film crystallinity in LPCVD process",

abstract = "Deposition of a thin film in the LPCVD process has been simulated by a Monte-Carlo method based on a simple model taking into account the desorption, the surface reaction, and the surface migration of the film precursor. The model has been used for the simulation of the film profile obtained in a narrow and deep trench and of the film crystallinity on a flat surface. The simulation results describe successfully those obtained by experiments under various process conditions.",

author = "Gyeong, {Soon Hwang} and Chee, {Burm Shin} and Sang, {Heup Moon}",

year = "1995",

language = "English",

volume = "389",

pages = "125--130",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Proceedings of the Spring Meeting on MRS ; Conference date: 17-04-1995 Through 20-04-1995",

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TY - JOUR

T1 - Simulation of film growth contour in a narrow deep trench and film crystallinity in LPCVD process

AU - Gyeong, Soon Hwang

AU - Chee, Burm Shin

AU - Sang, Heup Moon

PY - 1995

Y1 - 1995

N2 - Deposition of a thin film in the LPCVD process has been simulated by a Monte-Carlo method based on a simple model taking into account the desorption, the surface reaction, and the surface migration of the film precursor. The model has been used for the simulation of the film profile obtained in a narrow and deep trench and of the film crystallinity on a flat surface. The simulation results describe successfully those obtained by experiments under various process conditions.

AB - Deposition of a thin film in the LPCVD process has been simulated by a Monte-Carlo method based on a simple model taking into account the desorption, the surface reaction, and the surface migration of the film precursor. The model has been used for the simulation of the film profile obtained in a narrow and deep trench and of the film crystallinity on a flat surface. The simulation results describe successfully those obtained by experiments under various process conditions.

UR - http://www.scopus.com/inward/record.url?scp=0029190225&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0029190225

SN - 0272-9172

VL - 389

SP - 125

EP - 130

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the Spring Meeting on MRS

Y2 - 17 April 1995 through 20 April 1995

ER -

Simulation of film growth contour in a narrow deep trench and film crystallinity in LPCVD process

Abstract

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