Selective One-Electron Reduction of a Cationic Substrate, 10-Methylacridinium Ion, by Group 4B Dimetals, Me3SnMMe3 (M = Sn, Ge, Si), via Radical Chain Reactions

Shunichi Fukuzumi; Toshiaki Kitano; Kunio Mochida

doi:10.1021/ja00164a074

Selective One-Electron Reduction of a Cationic Substrate, 10-Methylacridinium Ion, by Group 4B Dimetals, Me3SnMMe3 (M = Sn, Ge, Si), via Radical Chain Reactions

Shunichi Fukuzumi, Toshiaki Kitano, Kunio Mochida

Department of Chemistry & Nanoscience

Research output: Contribution to journal › Article › peer-review

55 Scopus citations

Original language	English
Pages (from-to)	3246-3247
Number of pages	2
Journal	Journal of the American Chemical Society
Volume	112
Issue number	8
DOIs	https://doi.org/10.1021/ja00164a074
State	Published - Jan 1990

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10.1021/ja00164a074

Cite this

@article{755e99fbc08d4173ae18e64e1491be00,

title = "Selective One-Electron Reduction of a Cationic Substrate, 10-Methylacridinium Ion, by Group 4B Dimetals, Me3SnMMe3 (M = Sn, Ge, Si), via Radical Chain Reactions",

author = "Shunichi Fukuzumi and Toshiaki Kitano and Kunio Mochida",

year = "1990",

month = jan,

doi = "10.1021/ja00164a074",

language = "English",

volume = "112",

pages = "3246--3247",

journal = "Journal of the American Chemical Society",

issn = "0002-7863",

publisher = "American Chemical Society",

number = "8",

}

Selective One-Electron Reduction of a Cationic Substrate, 10-Methylacridinium Ion, by Group 4B Dimetals, Me3SnMMe3 (M = Sn, Ge, Si), via Radical Chain Reactions. / Fukuzumi, Shunichi; Kitano, Toshiaki; Mochida, Kunio.
In: Journal of the American Chemical Society, Vol. 112, No. 8, 01.1990, p. 3246-3247.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Selective One-Electron Reduction of a Cationic Substrate, 10-Methylacridinium Ion, by Group 4B Dimetals, Me3SnMMe3 (M = Sn, Ge, Si), via Radical Chain Reactions

AU - Fukuzumi, Shunichi

AU - Kitano, Toshiaki

AU - Mochida, Kunio

PY - 1990/1

Y1 - 1990/1

UR - https://www.scopus.com/pages/publications/0025003489

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DO - 10.1021/ja00164a074

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SN - 0002-7863

VL - 112

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EP - 3247

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

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