Abstract
Growth of individual, vertically aligned multiwalled carbon nanotubes (VACNT) on patterned Si wafers using dc plasma-enhanced CVD is described. The selective growth of individual VACNT within larger holes etched in Si is demonstrated for the first time.
| Original language | English |
|---|---|
| Pages (from-to) | 591-594 |
| Number of pages | 4 |
| Journal | Current Applied Physics |
| Volume | 4 |
| Issue number | 6 |
| DOIs | |
| State | Published - Nov 2004 |
Bibliographical note
Funding Information:Financial support from the Swedish Strategic Research Fund SSF (CARAMEL and NEMS), the EU (HPRN-CT-2000-00026) and STINT is gratefully acknowledged.
Keywords
- Controlled individual growth
- Multiwalled carbon nanotubes
- PECVD
- Plasma-enhanced chemical vapour deposition