Scanning probe lithography for fabrication of Ti metal nanodot arrays

B. Jung, W. Jo, M. J. Gwon, E. Lee, D. W. Kim

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


We report fabrication of Ti metal nanodot arrays by scanning probe microscopic indentation. A thin poly-methylmethacrylate (PMMA) layer was spin-coated on Si substrates with thickness of 70nm. Nanometer-size pore arrays were formed by indenting the PMMA layer using a cantilever of a scanning probe microscope. Protuberances with irregular boundaries appeared during the indentation process. Control of approach and pulling-out speed during indentation was able to dispose of the protrusions. Ti metal films were deposited on the patterned PMMA layers by a radio-frequency sputtering method and subsequently lifted off to obtain metal nanodot arrays. The fabricated metal nanodot arrays have 200nm of diameter and 500nm of interdistance, which corresponds to a density of 4×108/cm2. Scanning probe-based measurement of current-voltage (I-V) behaviors for a single Ti metal nanodot showed asymmetric characteristics. Applying external bias is likely to induce oxidation of Ti metal, since the conductance decreased and volume change of the dots was observed. I-V behaviors of Ti metal nanodots by conventional e-beam lithography were also characterized for comparison.

Original languageEnglish
Pages (from-to)737-740
Number of pages4
Issue number6
StatePublished - May 2010


  • Indentation
  • Scanning probe lithography
  • Titanium nanodot arrays


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