Pulsed laser deposition of Bi4Ti3O12 thin films on indium tin oxide coated glass

H. J. Cho, William Jo, T. W. Noh

Research output: Contribution to journalConference articlepeer-review


Bi4Ti3O12 thin films have been grown on indium tin oxide coated glass by pulsed laser deposition. The films are rapidly thermal annealed at 650°C in various kinds of ambients. X-ray diffraction and scanning electron microscopy are used to investigate crystallization and microstructures, respectively. Using Auger electron microscopy, chemical compositions and depth profiles are examined. Optical and current-voltage characteristics measurements of the films show that their transmittance and leakage current behaviors are strongly dependent upon the microstructures. O2 partial pressure in the rapid thermal annealing process is found to be an important parameter which determines crystallization, microstructures, and leakage current behaviors of the Bi4Ti3O12 thin films.

Original languageEnglish
Pages (from-to)475-480
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
StatePublished - 1994
EventProceedings of the 1994 MRS Spring Meeting - San Francisco, CA, USA
Duration: 5 Apr 19947 Apr 1994


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