Pulse-width influence on laser structuring of dielectrics

D. Ashkenasi, H. Varel, A. Rosenfeld, F. Noack, E. E.B. Campbell

Research output: Contribution to journalArticlepeer-review

43 Scopus citations

Abstract

The morphology of several dielectrics (a-SiO2, CaF2 and BaF2) irradiated by laser light at a wavelength of 790 nm for different pulse widths (between 200 fs and 5 ps) and fluences near the single shot damage threshold has been investigated by using the complementary techniques of electron microscopy and atomic force microscopy. Differences can be observed which we relate to the mechanisms and dynamics of defect production in these wide band gap materials.

Original languageEnglish
Pages (from-to)359-363
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume122
Issue number3
DOIs
StatePublished - Feb 1997

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