Physical analysis for saturation behavior of hot-carrier degradation in lightly doped drain N-channel metal-oxide-semiconductor field effect transistors

Jung Suk Goo, Hyungsoon Shin, Hyunsang Hwang, Dae Gwan Kang, Dong Hyuk Ju

Research output: Contribution to journalArticlepeer-review

22 Scopus citations

Fingerprint

Dive into the research topics of 'Physical analysis for saturation behavior of hot-carrier degradation in lightly doped drain N-channel metal-oxide-semiconductor field effect transistors'. Together they form a unique fingerprint.

Physics & Astronomy

Engineering & Materials Science