Photopatterning of poly(arylene dienylene) by the photoacid-catalyzed deprotection-elimination reaction of a precursor polymer

Precursor polymers prepared from l,4-dialkoxy-l,4-diarylcyclohexane monomers are converted to the conjugated poly(arylene dienylene)s during the course of an acid-catalyzed deprotection-elimination reaction, These materials are employed as combined active materials and photoresists in the surface patterning of luminescent conjugated polymers.