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Performance breakthrough in NOR flash memory with dopant-segregated Schottky-barrier (DSSB) SONOS devices

  • Sung Jin Choi
  • , Jin Woo Han
  • , Sungho Kim
  • , Dong Il Moon
  • , Moon Gyu Jang
  • , Su Kim Jin
  • , Hee Kim Kwang
  • , Sung Lee Gi
  • , Sub Oh Jae
  • , Ho Song Myong
  • , Chang Park Yun
  • , Woo Kim Jeoung
  • , Yang Kyu Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

7 Scopus citations

Abstract

A novel dopant segregated Schottky barrier (DSSB) SONOS device as a form of double-gate (DG) is demonstrated for NOR Flash memory applications. The DSSB also applies to all-around-gate (AAG) SONOS devices. The source side injection caused by sharp energy band bending in the DSSB device results in a high-speed programming (Vth shift of 4.2V @ 320ns) at a low program bias (V gs/Vds=7V/3V). Moreover, faster program speed in a narrower fin width (Wfin) due to its low parasitic resistance and enhanced gate controllability is achieved. Drain disturbance-free characteristics in a programmed cell are confirmed as well.

Original languageEnglish
Title of host publication2009 Symposium on VLSI Technology, VLSIT 2009
Pages222-223
Number of pages2
StatePublished - 2009
Event2009 Symposium on VLSI Technology, VLSIT 2009 - Kyoto, Japan
Duration: 16 Jun 200918 Jun 2009

Publication series

NameDigest of Technical Papers - Symposium on VLSI Technology
ISSN (Print)0743-1562

Conference

Conference2009 Symposium on VLSI Technology, VLSIT 2009
Country/TerritoryJapan
CityKyoto
Period16/06/0918/06/09

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