Performance breakthrough in NOR flash memory with dopant-segregated Schottky-barrier (DSSB) SONOS devices

Sung Jin Choi, Jin Woo Han, Sungho Kim, Dong Il Moon, Moon Gyu Jang, Su Kim Jin, Hee Kim Kwang, Sung Lee Gi, Sub Oh Jae, Ho Song Myong, Chang Park Yun, Woo Kim Jeoung, Yang Kyu Choi

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

5 Scopus citations

Abstract

A novel dopant segregated Schottky barrier (DSSB) SONOS device as a form of double-gate (DG) is demonstrated for NOR Flash memory applications. The DSSB also applies to all-around-gate (AAG) SONOS devices. The source side injection caused by sharp energy band bending in the DSSB device results in a high-speed programming (Vth shift of 4.2V @ 320ns) at a low program bias (V gs/Vds=7V/3V). Moreover, faster program speed in a narrower fin width (Wfin) due to its low parasitic resistance and enhanced gate controllability is achieved. Drain disturbance-free characteristics in a programmed cell are confirmed as well.

Original languageEnglish
Title of host publication2009 Symposium on VLSI Technology, VLSIT 2009
Pages222-223
Number of pages2
StatePublished - 2009
Event2009 Symposium on VLSI Technology, VLSIT 2009 - Kyoto, Japan
Duration: 16 Jun 200918 Jun 2009

Publication series

NameDigest of Technical Papers - Symposium on VLSI Technology
ISSN (Print)0743-1562

Conference

Conference2009 Symposium on VLSI Technology, VLSIT 2009
Country/TerritoryJapan
CityKyoto
Period16/06/0918/06/09

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