TY - JOUR
T1 - Pattern-dependent charging in plasmas
T2 - Electron temperature effects
AU - Hwang, Gyeong S.
AU - Giapis, Konstantinos P.
PY - 1997/1/1
Y1 - 1997/1/1
N2 - The differential charging of high-aspect-ratio dense structures during plasma etching is studied by two-dimensional Monte Carlo simulations. Enhanced electron shadowing at large electron temperatures is found to reduce the electron current density to the bottom of narrow trenches, causing buildup of large charging potentials on dielectric surfaces. These potentials alter the local ion dynamics, increase the flux of deflected ions towards the sidewalls, and result in distorted profiles. The simulation results capture reported experimental trends and reveal the physics of charging damage.
AB - The differential charging of high-aspect-ratio dense structures during plasma etching is studied by two-dimensional Monte Carlo simulations. Enhanced electron shadowing at large electron temperatures is found to reduce the electron current density to the bottom of narrow trenches, causing buildup of large charging potentials on dielectric surfaces. These potentials alter the local ion dynamics, increase the flux of deflected ions towards the sidewalls, and result in distorted profiles. The simulation results capture reported experimental trends and reveal the physics of charging damage.
UR - http://www.scopus.com/inward/record.url?scp=0031552799&partnerID=8YFLogxK
U2 - 10.1103/PhysRevLett.79.845
DO - 10.1103/PhysRevLett.79.845
M3 - Article
AN - SCOPUS:0031552799
SN - 0031-9007
VL - 79
SP - 845
EP - 848
JO - Physical Review Letters
JF - Physical Review Letters
IS - 5
ER -