Pattern-dependent charging in plasmas

Gyeong S. Hwang, Konstantinos P. Giapis

Research output: Contribution to journalArticlepeer-review

2 Scopus citations


When patterned surfaces are exposed to plasmas, the directionality difference between ions and electrons causes differential charging of the pattern. Potential contour maps, generated by Monte Carlo simulations of charging in mixed conductor-insulator structures, illustrate where charging occurs and how it becomes more aggravated as the number of features in the pattern increases (a feature multiplicity effect).

Original languageEnglish
Pages (from-to)102-103
Number of pages2
JournalIEEE Transactions on Plasma Science
Issue number1
StatePublished - 1999


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