When patterned surfaces are exposed to plasmas, the directionality difference between ions and electrons causes differential charging of the pattern. Potential contour maps, generated by Monte Carlo simulations of charging in mixed conductor-insulator structures, illustrate where charging occurs and how it becomes more aggravated as the number of features in the pattern increases (a feature multiplicity effect).
|Number of pages||2|
|Journal||IEEE Transactions on Plasma Science|
|State||Published - 1999|