When patterned surfaces are exposed to plasmas, the directionality difference between ions and electrons causes differential charging of the pattern. Potential contour maps, generated by Monte Carlo simulations of charging in mixed conductor-insulator structures, illustrate where charging occurs and how it becomes more aggravated as the number of features in the pattern increases (a feature multiplicity effect).
Bibliographical noteFunding Information:
Manuscript received June 19, 1998; revised November 12, 1998. This work was supported in part by NSF (ECS-9 729 968). The work of G. S. Hwang was supported by an Applied Materials Scholarship. The work of K. P. Giapis was supported by a Camille Dreyfus Teacher-Scholar Award.