Pattern-dependent charging damage in high density plasma processes

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	56-57
Number of pages	2
Journal	Electrochemical Society Interface
Volume	7
Issue number	4
DOIs	https://doi.org/10.1149/2.f10984if
State	Published - 1998

Access to Document

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title = "Pattern-dependent charging damage in high density plasma processes",

author = "Hwang, \{Gyeong Soon\}",

year = "1998",

doi = "10.1149/2.f10984if",

language = "English",

volume = "7",

pages = "56--57",

journal = "Electrochemical Society Interface",

issn = "1064-8208",

publisher = "Institute of Physics",

number = "4",

}

TY - JOUR

T1 - Pattern-dependent charging damage in high density plasma processes

AU - Hwang, Gyeong Soon

PY - 1998

Y1 - 1998

UR - https://www.scopus.com/pages/publications/0032314974

U2 - 10.1149/2.f10984if

DO - 10.1149/2.f10984if

M3 - Article

AN - SCOPUS:0032314974

SN - 1064-8208

VL - 7

SP - 56

EP - 57

JO - Electrochemical Society Interface

JF - Electrochemical Society Interface

IS - 4

ER -