Partially depleted SONOS FinFET for unified RAM (URAM) - Unified function for high-speed 1T DRAM and nonvolatile memory

  • Jin Woo Han
  • , Seong Wan Ryu
  • , Chung Jin Kim
  • , Sungho Kim
  • , Maesoon Im
  • , Sung Jin Choi
  • , Jin Soo Kim
  • , Kwang Hee Kim
  • , Gi Sung Lee
  • , Jae Sub Oh
  • , Myeong Ho Song
  • , Yun Chang Park
  • , Jeoung Woo Kim
  • , Yang Kyu Choi

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

Unified random access memory (URAM) is demonstrated for the first time. The novel partially depleted (PD) SONOS FinFET provides unified function of a high-speed capacitorless 1T DRAM and a nonvolatile memory (NVM). The combination of an oxide/nitride/oxide (O/N/O) layer and a floating-body facilitates URAM operation in PD SONOS FinFETs. An NVM function is achieved by FN tunneling into the O/N/O stack and, a 1T-DRAM function is achieved by excessive-hole accumulation in the PD body. The fabricated PD SONOS FinFET shows retention time exceeding 10 years for NVM operation and program/erase time below 6 ns for 1T-DRAM in a single-cell transistor. These two memory functions are guaranteed without disturbance between them.

Original languageEnglish
Pages (from-to)781-783
Number of pages3
JournalIEEE Electron Device Letters
Volume29
Issue number7
DOIs
StatePublished - Jul 2008

Keywords

  • 1T DRAM
  • Capacitorless DRAM
  • FinFET
  • Nonvolatile memory (NVM)
  • SONOS
  • Unified RAM (URAM)

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