On the replication of block copolymer templates by poly(dimethylsiloxane) elastomers

Dong Ha Kim; Zhiqun Lin; Ho Cheol Kim; Unyong Jeong; Thomas P. Russell

doi:10.1002/adma.200304581

On the replication of block copolymer templates by poly(dimethylsiloxane) elastomers

Dong Ha Kim, Zhiqun Lin, Ho Cheol Kim, Unyong Jeong, Thomas P. Russell

Department of Chemistry & Nanoscience

Research output: Contribution to journal › Article › peer-review

55 Scopus citations

Abstract

Recently there were considerable interest in fabricating sub-micrometer and nanometer-scale structures. The ability to pattern surfaces with regularly sized and spaced features on the nanoscopic level was desirable for many potential applications. Thus, block copolymers offer an attractive route to overcome some of the limitation of conventional lithographic techniques, since they self-assemble into a variety of ordered morphologies on the length scale of tens of nanometers.

Original language	English
Pages (from-to)	811-814
Number of pages	4
Journal	Advanced Materials
Volume	15
Issue number	10
DOIs	https://doi.org/10.1002/adma.200304581
State	Published - 16 May 2003

Access to Document

10.1002/adma.200304581

Cite this

@article{4a4fef4e483e448a85344934cc0f4a8f,

title = "On the replication of block copolymer templates by poly(dimethylsiloxane) elastomers",

abstract = "Recently there were considerable interest in fabricating sub-micrometer and nanometer-scale structures. The ability to pattern surfaces with regularly sized and spaced features on the nanoscopic level was desirable for many potential applications. Thus, block copolymers offer an attractive route to overcome some of the limitation of conventional lithographic techniques, since they self-assemble into a variety of ordered morphologies on the length scale of tens of nanometers.",

author = "Kim, {Dong Ha} and Zhiqun Lin and Kim, {Ho Cheol} and Unyong Jeong and Russell, {Thomas P.}",

year = "2003",

month = may,

day = "16",

doi = "10.1002/adma.200304581",

language = "English",

volume = "15",

pages = "811--814",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "10",

}

TY - JOUR

T1 - On the replication of block copolymer templates by poly(dimethylsiloxane) elastomers

AU - Kim, Dong Ha

AU - Lin, Zhiqun

AU - Kim, Ho Cheol

AU - Jeong, Unyong

AU - Russell, Thomas P.

PY - 2003/5/16

Y1 - 2003/5/16

N2 - Recently there were considerable interest in fabricating sub-micrometer and nanometer-scale structures. The ability to pattern surfaces with regularly sized and spaced features on the nanoscopic level was desirable for many potential applications. Thus, block copolymers offer an attractive route to overcome some of the limitation of conventional lithographic techniques, since they self-assemble into a variety of ordered morphologies on the length scale of tens of nanometers.

AB - Recently there were considerable interest in fabricating sub-micrometer and nanometer-scale structures. The ability to pattern surfaces with regularly sized and spaced features on the nanoscopic level was desirable for many potential applications. Thus, block copolymers offer an attractive route to overcome some of the limitation of conventional lithographic techniques, since they self-assemble into a variety of ordered morphologies on the length scale of tens of nanometers.

UR - http://www.scopus.com/inward/record.url?scp=0037701157&partnerID=8YFLogxK

U2 - 10.1002/adma.200304581

DO - 10.1002/adma.200304581

M3 - Article

AN - SCOPUS:0037701157

SN - 0935-9648

VL - 15

SP - 811

EP - 814

JO - Advanced Materials

JF - Advanced Materials

IS - 10

ER -

On the replication of block copolymer templates by poly(dimethylsiloxane) elastomers

Abstract

Access to Document

Fingerprint

Cite this