On the replication of block copolymer templates by poly(dimethylsiloxane) elastomers

Dong Ha Kim, Zhiqun Lin, Ho Cheol Kim, Unyong Jeong, Thomas P. Russell

Research output: Contribution to journalArticlepeer-review

54 Scopus citations

Abstract

Recently there were considerable interest in fabricating sub-micrometer and nanometer-scale structures. The ability to pattern surfaces with regularly sized and spaced features on the nanoscopic level was desirable for many potential applications. Thus, block copolymers offer an attractive route to overcome some of the limitation of conventional lithographic techniques, since they self-assemble into a variety of ordered morphologies on the length scale of tens of nanometers.

Original languageEnglish
Pages (from-to)811-814
Number of pages4
JournalAdvanced Materials
Volume15
Issue number10
DOIs
StatePublished - 16 May 2003

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