Nioblum trilayer process for superconducting circuits

J. M. Murduck, J. Porter, W. Dozier, R. Sandell, J. Burch, J. Bulman, C. Dang, L. Lee, H. Chan, R. W. Simon, A. H. Silver

Research output: Contribution to journalArticlepeer-review

21 Scopus citations


We have developed an improved in situ trilayer process for fabricating Josephson circuits. By controlling a multilayer artificial barrier of oxidized aluminum, current densities from 6 to 7000 A/cm2 are reproducibly and accurately obtained. Junction leakage is low, with Vm values typically ≥ 40 mV, and is found to be dependent on the niobium deposition rate. Within TRW the niobium junctions are being used for parametric amplifiers, A/D converters, VCO's, IR detectors, and digital circuits. In addition, TRW niobium junctions have successfully been used in the NBS Josephson voltage standard. We will describe the fabrication process and characterize the films made.

Original languageEnglish
Pages (from-to)1139-1142
Number of pages4
JournalIEEE Transactions on Magnetics
Issue number2
StatePublished - Mar 1989


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