Nanoxerography utilizing bipolar charge patterns

Kyunghoon Lim; Jung Rok Lee; Heechul Lee; Peter V. Pikhitsa; Sukbeom You; Chang Gyu Woo; Pilnam Kim; Kahp Y. Suh; Mansoo Choi

doi:10.1063/1.4766180

Nanoxerography utilizing bipolar charge patterns

Kyunghoon Lim, Jung Rok Lee, Heechul Lee, Peter V. Pikhitsa, Sukbeom You, Chang Gyu Woo, Pilnam Kim, Kahp Y. Suh, Mansoo Choi

Department of Mechanical & Biomedical Engineering

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

We report a nanoxerography utilizing alternating bipolar surface charge patterns. Unlike a conventional nanoxerography using unipolar charge patterns, the present concept generates convex shaped equipotential planes with large curvature that can act as nanoscopic electrostatic lenses. Through these lenses, positively charged aerosol nanoparticles are focused into the center region of the negative surface charge pattern leading to the significant reduction of particle deposition width. We also demonstrate that the focusing capability can be controlled by changing ion flow rates. Numerical simulations of the trajectory and deposition of charged particles were done to support experimental results.

Original language	English
Article number	203106
Journal	Applied Physics Letters
Volume	101
Issue number	20
DOIs	https://doi.org/10.1063/1.4766180
State	Published - 12 Nov 2012

Bibliographical note

Funding Information:
This work was supported by the Global Frontier Center for Multiscale Energy Systems funded by National Research Foundation under the Ministry of Education, Science and Technology (2011-0031561). Financial support from BK21 program and WCU (World Class University) multiscale mechanical design program (R31-2008-000-10083-0) through the Korea Research Foundation is gratefully acknowledged. Authors are also affiliated with the Institute of Advanced Machinery and Design, Seoul National University, Seoul 151-742, Republic of Korea.

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title = "Nanoxerography utilizing bipolar charge patterns",

abstract = "We report a nanoxerography utilizing alternating bipolar surface charge patterns. Unlike a conventional nanoxerography using unipolar charge patterns, the present concept generates convex shaped equipotential planes with large curvature that can act as nanoscopic electrostatic lenses. Through these lenses, positively charged aerosol nanoparticles are focused into the center region of the negative surface charge pattern leading to the significant reduction of particle deposition width. We also demonstrate that the focusing capability can be controlled by changing ion flow rates. Numerical simulations of the trajectory and deposition of charged particles were done to support experimental results.",

author = "Kyunghoon Lim and Lee, {Jung Rok} and Heechul Lee and Pikhitsa, {Peter V.} and Sukbeom You and {Gyu Woo}, Chang and Pilnam Kim and Suh, {Kahp Y.} and Mansoo Choi",

note = "Funding Information: This work was supported by the Global Frontier Center for Multiscale Energy Systems funded by National Research Foundation under the Ministry of Education, Science and Technology (2011-0031561). Financial support from BK21 program and WCU (World Class University) multiscale mechanical design program (R31-2008-000-10083-0) through the Korea Research Foundation is gratefully acknowledged. Authors are also affiliated with the Institute of Advanced Machinery and Design, Seoul National University, Seoul 151-742, Republic of Korea.",

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month = nov,

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doi = "10.1063/1.4766180",

language = "English",

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AU - Lee, Jung Rok

AU - Lee, Heechul

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AU - You, Sukbeom

AU - Gyu Woo, Chang

AU - Kim, Pilnam

AU - Suh, Kahp Y.

AU - Choi, Mansoo

N1 - Funding Information: This work was supported by the Global Frontier Center for Multiscale Energy Systems funded by National Research Foundation under the Ministry of Education, Science and Technology (2011-0031561). Financial support from BK21 program and WCU (World Class University) multiscale mechanical design program (R31-2008-000-10083-0) through the Korea Research Foundation is gratefully acknowledged. Authors are also affiliated with the Institute of Advanced Machinery and Design, Seoul National University, Seoul 151-742, Republic of Korea.

PY - 2012/11/12

Y1 - 2012/11/12

N2 - We report a nanoxerography utilizing alternating bipolar surface charge patterns. Unlike a conventional nanoxerography using unipolar charge patterns, the present concept generates convex shaped equipotential planes with large curvature that can act as nanoscopic electrostatic lenses. Through these lenses, positively charged aerosol nanoparticles are focused into the center region of the negative surface charge pattern leading to the significant reduction of particle deposition width. We also demonstrate that the focusing capability can be controlled by changing ion flow rates. Numerical simulations of the trajectory and deposition of charged particles were done to support experimental results.

AB - We report a nanoxerography utilizing alternating bipolar surface charge patterns. Unlike a conventional nanoxerography using unipolar charge patterns, the present concept generates convex shaped equipotential planes with large curvature that can act as nanoscopic electrostatic lenses. Through these lenses, positively charged aerosol nanoparticles are focused into the center region of the negative surface charge pattern leading to the significant reduction of particle deposition width. We also demonstrate that the focusing capability can be controlled by changing ion flow rates. Numerical simulations of the trajectory and deposition of charged particles were done to support experimental results.

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Nanoxerography utilizing bipolar charge patterns

Abstract

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