Abstract
We present a new method of increasing the effective electrode surface for improved neural recording. To optimize the electrode, the impedance can be decreased by introducing surface roughness or nanostructures on the electrode. High aspect ratio pillar-like polysilicon nanostructures are created in a reactive ion etch. Nanostructure robustness in cell culture is examined.
Original language | English |
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Pages (from-to) | 191-196 |
Number of pages | 6 |
Journal | Materials Research Society Symposium - Proceedings |
Volume | 729 |
DOIs | |
State | Published - 2002 |
Event | BioMEMS and Bionanotechnology - San Francisco, CA, United States Duration: 1 Apr 2002 → 3 Apr 2002 |