Nanohillock formation by impact of small low-energy clusters with surfaces

V. N. Popok; S. V. Prasalovich; E. E.B. Campbell

doi:10.1016/S0168-583X(03)00616-5

Nanohillock formation by impact of small low-energy clusters with surfaces

V. N. Popok, S. V. Prasalovich, E. E.B. Campbell

Department of Physics

Research output: Contribution to journal › Article › peer-review

26 Scopus citations

Abstract

Results on nanoscale structuring of different substrates (silicon, pyrolytic graphite, indium-tin-oxide) using clusters from 20 to 100 atoms in size formed from gaseous precursors (O₂, N₂, Ar) at relatively low impact energy up to 15 keV are presented. Images of the substrate surfaces after cluster collisions obtained using atomic force microscopy show the formation of hillocks from a few to 15 nm height with a basal diameter from 50 to 300 nm depending on implantation conditions. The shape and size of the structures are found to be a function of the cluster size and species, implantation energy, impact angle and the type of substrate. A model explaining the hillock formation is discussed.

Original language	English
Pages (from-to)	145-153
Number of pages	9
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	207
Issue number	2
DOIs	https://doi.org/10.1016/S0168-583X(03)00616-5
State	Published - Jun 2003

Bibliographical note

Funding Information:
Authors acknowledge financial support from the Göran Gustafsson Foundation for Research in Natural Science and Medicine and The Swedish Research Council (Vetenskapsrådet, contract No. 621-2002-5387).

Keywords

Atomic force microscopy
Cluster ion implantation
Nanosize hillock
Pulsed cluster source

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10.1016/S0168-583X(03)00616-5

Cite this

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title = "Nanohillock formation by impact of small low-energy clusters with surfaces",

abstract = "Results on nanoscale structuring of different substrates (silicon, pyrolytic graphite, indium-tin-oxide) using clusters from 20 to 100 atoms in size formed from gaseous precursors (O2, N2, Ar) at relatively low impact energy up to 15 keV are presented. Images of the substrate surfaces after cluster collisions obtained using atomic force microscopy show the formation of hillocks from a few to 15 nm height with a basal diameter from 50 to 300 nm depending on implantation conditions. The shape and size of the structures are found to be a function of the cluster size and species, implantation energy, impact angle and the type of substrate. A model explaining the hillock formation is discussed.",

keywords = "Atomic force microscopy, Cluster ion implantation, Nanosize hillock, Pulsed cluster source",

author = "Popok, {V. N.} and Prasalovich, {S. V.} and Campbell, {E. E.B.}",

note = "Funding Information: Authors acknowledge financial support from the G{\"o}ran Gustafsson Foundation for Research in Natural Science and Medicine and The Swedish Research Council (Vetenskapsr{\aa}det, contract No. 621-2002-5387).",

year = "2003",

month = jun,

doi = "10.1016/S0168-583X(03)00616-5",

language = "English",

volume = "207",

pages = "145--153",

journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",

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T1 - Nanohillock formation by impact of small low-energy clusters with surfaces

AU - Popok, V. N.

AU - Prasalovich, S. V.

AU - Campbell, E. E.B.

N1 - Funding Information: Authors acknowledge financial support from the Göran Gustafsson Foundation for Research in Natural Science and Medicine and The Swedish Research Council (Vetenskapsrådet, contract No. 621-2002-5387).

PY - 2003/6

Y1 - 2003/6

N2 - Results on nanoscale structuring of different substrates (silicon, pyrolytic graphite, indium-tin-oxide) using clusters from 20 to 100 atoms in size formed from gaseous precursors (O2, N2, Ar) at relatively low impact energy up to 15 keV are presented. Images of the substrate surfaces after cluster collisions obtained using atomic force microscopy show the formation of hillocks from a few to 15 nm height with a basal diameter from 50 to 300 nm depending on implantation conditions. The shape and size of the structures are found to be a function of the cluster size and species, implantation energy, impact angle and the type of substrate. A model explaining the hillock formation is discussed.

AB - Results on nanoscale structuring of different substrates (silicon, pyrolytic graphite, indium-tin-oxide) using clusters from 20 to 100 atoms in size formed from gaseous precursors (O2, N2, Ar) at relatively low impact energy up to 15 keV are presented. Images of the substrate surfaces after cluster collisions obtained using atomic force microscopy show the formation of hillocks from a few to 15 nm height with a basal diameter from 50 to 300 nm depending on implantation conditions. The shape and size of the structures are found to be a function of the cluster size and species, implantation energy, impact angle and the type of substrate. A model explaining the hillock formation is discussed.

KW - Atomic force microscopy

KW - Cluster ion implantation

KW - Nanosize hillock

KW - Pulsed cluster source

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DO - 10.1016/S0168-583X(03)00616-5

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JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

IS - 2

ER -

Nanohillock formation by impact of small low-energy clusters with surfaces

Abstract

Bibliographical note

Keywords

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