TY - JOUR
T1 - Morphology control of patterned carbon nanofiber arrays for field emission applications
AU - Kim, Dong Wook
AU - Jin, Sungho
PY - 2006/1/10
Y1 - 2006/1/10
N2 - Carbon nanofibers (CNFs), grown by dc plasma-enhanced chemical vapor deposition, have differences in morphology and resulting field emission properties depending on underlying buffer layers. We patterned 200-nm-sized Ni catalyst dots, with 2-5 μm spacing, by e-beam lithography and obtained regularly spaced vertically aligned CNF arrays. CNFs, grown on Ti-buffered Si substrates, showed a needle like shape with a high aspect ratio, but CNFs directly grown on Si substrates, had a cone like shape. The former showed a smaller turn-on field (11 V/μm) than the latter (27 V/μm), in field emission current measurements. Moreover, the maximum current density of the CNF array on Ti was as high as 10 A/cm2.
AB - Carbon nanofibers (CNFs), grown by dc plasma-enhanced chemical vapor deposition, have differences in morphology and resulting field emission properties depending on underlying buffer layers. We patterned 200-nm-sized Ni catalyst dots, with 2-5 μm spacing, by e-beam lithography and obtained regularly spaced vertically aligned CNF arrays. CNFs, grown on Ti-buffered Si substrates, showed a needle like shape with a high aspect ratio, but CNFs directly grown on Si substrates, had a cone like shape. The former showed a smaller turn-on field (11 V/μm) than the latter (27 V/μm), in field emission current measurements. Moreover, the maximum current density of the CNF array on Ti was as high as 10 A/cm2.
KW - Carbon nanofiber
KW - Dc plasma-enhanced chemical vapor deposition
KW - Field emission
KW - Morphology
UR - http://www.scopus.com/inward/record.url?scp=31544434532&partnerID=8YFLogxK
U2 - 10.1143/JJAP.45.346
DO - 10.1143/JJAP.45.346
M3 - Article
AN - SCOPUS:31544434532
SN - 0021-4922
VL - 45
SP - 346
EP - 349
JO - Japanese Journal of Applied Physics
JF - Japanese Journal of Applied Physics
IS - 1 A
ER -