Morphology control of patterned carbon nanofiber arrays for field emission applications

Dong Wook Kim, Sungho Jin

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

Carbon nanofibers (CNFs), grown by dc plasma-enhanced chemical vapor deposition, have differences in morphology and resulting field emission properties depending on underlying buffer layers. We patterned 200-nm-sized Ni catalyst dots, with 2-5 μm spacing, by e-beam lithography and obtained regularly spaced vertically aligned CNF arrays. CNFs, grown on Ti-buffered Si substrates, showed a needle like shape with a high aspect ratio, but CNFs directly grown on Si substrates, had a cone like shape. The former showed a smaller turn-on field (11 V/μm) than the latter (27 V/μm), in field emission current measurements. Moreover, the maximum current density of the CNF array on Ti was as high as 10 A/cm2.

Original languageEnglish
Pages (from-to)346-349
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume45
Issue number1 A
DOIs
StatePublished - 10 Jan 2006

Keywords

  • Carbon nanofiber
  • Dc plasma-enhanced chemical vapor deposition
  • Field emission
  • Morphology

Fingerprint

Dive into the research topics of 'Morphology control of patterned carbon nanofiber arrays for field emission applications'. Together they form a unique fingerprint.

Cite this