Morphology and luminescence of poly (p-phenylene vinylene) films prepared by chemical vapor deposition

Guolun Zhong; Kyungkon Kim; Dongjune Ahn; Taeyoung Kim; Jung Il Jin

doi:10.1080/10587250290088816

Morphology and luminescence of poly (p-phenylene vinylene) films prepared by chemical vapor deposition

Guolun Zhong, Kyungkon Kim, Dongjune Ahn, Taeyoung Kim, Jung Il Jin

Department of Chemistry & Nanoscience

Research output: Contribution to journal › Conference article › peer-review

3 Scopus citations

Abstract

The films of poly(p-phenylene vinylene) (PPV) were prepared by chemical vapor deposition (CVD) of α,α′-dichloro-p-xylene on the surface of crystalline silicon (001) wafer. Atomic force microscopy (AFM) and reflective IR were used for measuring the topographic images and the orientations of PPV chains, respectively. Photoluminescent (PL) property of the PPV films indicates that the details of PL spectrum are dependent on the thickness of the films deposited on the wafer surface. The UV-vis spectrum was also measured for the PPV films deposited on the amorphous quartz substrate.

Original language	English
Pages (from-to)	169-172
Number of pages	4
Journal	Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals
Volume	377
DOIs	https://doi.org/10.1080/10587250290088816
State	Published - 2002
Event	Proceedings of the Korea-Japan Joint Forum on Organic Materials for Electronics and Photonics (KJF2001) - Seoul, Korea, Republic of Duration: 25 Sep 2001 → 27 Sep 2001

Keywords

Atomic force microscopy
Chemical vapor deposition
PPV
Photoluminescence
Reflective IR
Silicon wafer

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10.1080/10587250290088816

Cite this

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title = "Morphology and luminescence of poly (p-phenylene vinylene) films prepared by chemical vapor deposition",

abstract = "The films of poly(p-phenylene vinylene) (PPV) were prepared by chemical vapor deposition (CVD) of α,α′-dichloro-p-xylene on the surface of crystalline silicon (001) wafer. Atomic force microscopy (AFM) and reflective IR were used for measuring the topographic images and the orientations of PPV chains, respectively. Photoluminescent (PL) property of the PPV films indicates that the details of PL spectrum are dependent on the thickness of the films deposited on the wafer surface. The UV-vis spectrum was also measured for the PPV films deposited on the amorphous quartz substrate.",

keywords = "Atomic force microscopy, Chemical vapor deposition, PPV, Photoluminescence, Reflective IR, Silicon wafer",

author = "Guolun Zhong and Kyungkon Kim and Dongjune Ahn and Taeyoung Kim and Jin, {Jung Il}",

year = "2002",

doi = "10.1080/10587250290088816",

language = "English",

volume = "377",

pages = "169--172",

journal = "Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals",

issn = "1058-725X",

publisher = "Taylor and Francis Ltd.",

note = "Proceedings of the Korea-Japan Joint Forum on Organic Materials for Electronics and Photonics (KJF2001) ; Conference date: 25-09-2001 Through 27-09-2001",

}

Morphology and luminescence of poly (p-phenylene vinylene) films prepared by chemical vapor deposition. / Zhong, Guolun; Kim, Kyungkon; Ahn, Dongjune et al.
In: Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals, Vol. 377, 2002, p. 169-172.

Research output: Contribution to journal › Conference article › peer-review

TY - JOUR

T1 - Morphology and luminescence of poly (p-phenylene vinylene) films prepared by chemical vapor deposition

AU - Zhong, Guolun

AU - Kim, Kyungkon

AU - Ahn, Dongjune

AU - Kim, Taeyoung

AU - Jin, Jung Il

PY - 2002

Y1 - 2002

N2 - The films of poly(p-phenylene vinylene) (PPV) were prepared by chemical vapor deposition (CVD) of α,α′-dichloro-p-xylene on the surface of crystalline silicon (001) wafer. Atomic force microscopy (AFM) and reflective IR were used for measuring the topographic images and the orientations of PPV chains, respectively. Photoluminescent (PL) property of the PPV films indicates that the details of PL spectrum are dependent on the thickness of the films deposited on the wafer surface. The UV-vis spectrum was also measured for the PPV films deposited on the amorphous quartz substrate.

AB - The films of poly(p-phenylene vinylene) (PPV) were prepared by chemical vapor deposition (CVD) of α,α′-dichloro-p-xylene on the surface of crystalline silicon (001) wafer. Atomic force microscopy (AFM) and reflective IR were used for measuring the topographic images and the orientations of PPV chains, respectively. Photoluminescent (PL) property of the PPV films indicates that the details of PL spectrum are dependent on the thickness of the films deposited on the wafer surface. The UV-vis spectrum was also measured for the PPV films deposited on the amorphous quartz substrate.

KW - Atomic force microscopy

KW - Chemical vapor deposition

KW - PPV

KW - Photoluminescence

KW - Reflective IR

KW - Silicon wafer

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U2 - 10.1080/10587250290088816

DO - 10.1080/10587250290088816

M3 - Conference article

AN - SCOPUS:0042758868

SN - 1058-725X

VL - 377

SP - 169

EP - 172

JO - Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

JF - Molecular Crystals and Liquid Crystals Science and Technology Section A: Molecular Crystals and Liquid Crystals

T2 - Proceedings of the Korea-Japan Joint Forum on Organic Materials for Electronics and Photonics (KJF2001)

Y2 - 25 September 2001 through 27 September 2001

ER -

Morphology and luminescence of poly (p-phenylene vinylene) films prepared by chemical vapor deposition

Abstract

Keywords

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