Molecular layer deposition of ZrO₂-based organic-inorganic nanohybrid thin films for organic thin film transistors

Engineering & Materials Science

• Adsorption 19%
• Atomic layer deposition 89%
• Chemical activation 17%
• Electric potential 10%
• Gases 11%
• Mechanical stability 25%
• Ozone 24%
• Permittivity 19%
• Superlattices 36%
• Surface reactions 28%
• Temperature 7%
• Thin film transistors 100%
• Thin films 73%
• Vacuum 17%
• Zirconium 24%

Chemical Compounds

• Adsorption 12%
• Atomic Layer Epitaxy 90%
• Compound Mobility 19%
• Deposition Technique 28%
• Dielectric Constant 23%
• Dielectric Material 23%
• Double Bond 20%
• Field Effect 25%
• Hydroxyl 21%
• Liquid Film 12%
• Molecular Layer 33%
• Ozone 26%
• Superlattice 26%
• Vacuum 20%
• Voltage 18%

Physics & Astronomy

• activation 7%
• adsorption 7%
• atomic layer epitaxy 30%
• low voltage 9%
• ozone 10%
• permittivity 6%
• preparation 7%
• superlattices 9%
• surface reactions 10%
• temperature 2%
• thin films 40%
• transistors 62%
• vacuum 6%
• vapor phases 7%