Abstract
A new physically-based model for electron effective mobility in MOS inversion layers has been developed. By accounting for screened Coulomb scattering owing to ionised impurities, our model describes very well the roll-off of mobility in the low field region for a wide range of channel doping levels.
| Original language | English |
|---|---|
| Pages (from-to) | 1789-1791 |
| Number of pages | 3 |
| Journal | Electronics Letters |
| Volume | 31 |
| Issue number | 20 |
| DOIs | |
| State | Published - 28 Sep 1995 |