Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique

Eunah Kim; Yunae Cho; Kwang Tae Park; Jun Hyuk Choi; Seung Hyuk Lim; Yong Hoon Cho; Yoon Ho Nam; Jung Ho Lee; Dong Wook Kim

doi:10.1186/s11671-015-0865-8

Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique

Eunah Kim, Yunae Cho, Kwang Tae Park, Jun Hyuk Choi, Seung Hyuk Lim, Yong Hoon Cho, Yoon Ho Nam, Jung Ho Lee, Dong Wook Kim

Department of Physics

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection. PACS: 88.40.H-; 88.40.jp; 81.07.Gf

Original language	English
Article number	164
Journal	Nanoscale Research Letters
Volume	10
Issue number	1
DOIs	https://doi.org/10.1186/s11671-015-0865-8
State	Published - 1 Dec 2015

Bibliographical note

Funding Information:
This work was supported by New & Renewable Energy Technology Development Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) Grant (20123010010160).

Publisher Copyright:
© 2015, Kim et al.; licensee Springer.

Keywords

Antireflection
Mie resonance
Nanocone array
Nanoimprint
Si

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10.1186/s11671-015-0865-8

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title = "Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique",

abstract = "We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection. PACS: 88.40.H-; 88.40.jp; 81.07.Gf",

keywords = "Antireflection, Mie resonance, Nanocone array, Nanoimprint, Si",

author = "Eunah Kim and Yunae Cho and Park, {Kwang Tae} and Choi, {Jun Hyuk} and Lim, {Seung Hyuk} and Cho, {Yong Hoon} and Nam, {Yoon Ho} and Lee, {Jung Ho} and Kim, {Dong Wook}",

note = "Funding Information: This work was supported by New & Renewable Energy Technology Development Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) Grant (20123010010160). Publisher Copyright: {\textcopyright} 2015, Kim et al.; licensee Springer.",

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doi = "10.1186/s11671-015-0865-8",

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AU - Kim, Eunah

AU - Cho, Yunae

AU - Park, Kwang Tae

AU - Choi, Jun Hyuk

AU - Lim, Seung Hyuk

AU - Cho, Yong Hoon

AU - Nam, Yoon Ho

AU - Lee, Jung Ho

AU - Kim, Dong Wook

N1 - Funding Information: This work was supported by New & Renewable Energy Technology Development Program of the Korea Institute of Energy Technology Evaluation and Planning (KETEP) Grant (20123010010160). Publisher Copyright: © 2015, Kim et al.; licensee Springer.

PY - 2015/12/1

Y1 - 2015/12/1

N2 - We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection. PACS: 88.40.H-; 88.40.jp; 81.07.Gf

AB - We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection. PACS: 88.40.H-; 88.40.jp; 81.07.Gf

KW - Antireflection

KW - Mie resonance

KW - Nanocone array

KW - Nanoimprint

KW - Si

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ER -

Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique

Abstract

Bibliographical note

Keywords

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