Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique

Eunah Kim, Yunae Cho, Kwang Tae Park, Jun Hyuk Choi, Seung Hyuk Lim, Yong Hoon Cho, Yoon Ho Nam, Jung Ho Lee, Dong Wook Kim

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

We fabricated 8-in. Si nanocone (NC) arrays using a nanoimprint technique and investigated their optical characteristics. The NC arrays exhibited remarkable antireflection effects; the optical reflectance was less than 10% in the visible wavelength range. The photoluminescence intensity of the NC arrays was an order of magnitude larger than that of a planar wafer. Optical simulations and analyses suggested that the Mie resonance reduced effective refractive index, and multiple scattering in the NCs enabled the drastic decrease in reflection. PACS: 88.40.H-; 88.40.jp; 81.07.Gf

Original languageEnglish
Article number164
JournalNanoscale Research Letters
Volume10
Issue number1
DOIs
StatePublished - 1 Dec 2015

Keywords

  • Antireflection
  • Mie resonance
  • Nanocone array
  • Nanoimprint
  • Si

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