Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology
Byung Soo Kang, Young Taeg Sul, Yongsoo Jeong, Eungsun Byon, Jong Kuk Kim, Suyeon Cho, Se Jung Oh, Tomas Albrektsson
Research output: Contribution to journal › Article › peer-review
12Scopus
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