Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology
- Byung Soo Kang
- , Young Taeg Sul
- , Yongsoo Jeong
- , Eungsun Byon
- , Jong Kuk Kim
- , Suyeon Cho
- , Se Jung Oh
- , Tomas Albrektsson
Research output: Contribution to journal › Article › peer-review
12
Scopus
citations