Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology

Byung Soo Kang, Young Taeg Sul, Yongsoo Jeong, Eungsun Byon, Jong Kuk Kim, Suyeon Cho, Se Jung Oh, Tomas Albrektsson

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

The present study investigated the effect of metal plasma immersion ion implantation and deposition (MePIIID) process parameters, i.e., plasma sources of magnesium and calcium, ion dose, and acceleration voltage on the surface chemistry and morphology of screw-type titanium implants that have been most widely used for osseointegrated implants. It is found that irrespective of plasma ion source, surface topography and roughness showed no differences at the nanometer level; that atom concentrations increased with ion dose but decreased with acceleration voltage. Data obtained from X-ray photoelectron spectroscopy and auger electron spectroscopy suggested that MePIIID process produces 'intermixed' layer of cathodic arc deposition and plasma immersion ion implantation. The MePIIID process may create desired bioactive surface chemistry of dental and orthopaedic implants by tailoring ion and plasma sources and thus enable investigations of the effect of the surface chemistry on bone response.

Original languageEnglish
Pages (from-to)730-738
Number of pages9
JournalMedical Engineering and Physics
Volume33
Issue number6
DOIs
StatePublished - Jul 2011

Keywords

  • Calcium
  • Magnesium
  • Metal plasma immersion ion implantation and deposition (MePIIID)
  • Surface chemistry and topography
  • Titanium implant

Fingerprint

Dive into the research topics of 'Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology'. Together they form a unique fingerprint.

Cite this