The present study investigated the effect of metal plasma immersion ion implantation and deposition (MePIIID) process parameters, i.e., plasma sources of magnesium and calcium, ion dose, and acceleration voltage on the surface chemistry and morphology of screw-type titanium implants that have been most widely used for osseointegrated implants. It is found that irrespective of plasma ion source, surface topography and roughness showed no differences at the nanometer level; that atom concentrations increased with ion dose but decreased with acceleration voltage. Data obtained from X-ray photoelectron spectroscopy and auger electron spectroscopy suggested that MePIIID process produces 'intermixed' layer of cathodic arc deposition and plasma immersion ion implantation. The MePIIID process may create desired bioactive surface chemistry of dental and orthopaedic implants by tailoring ion and plasma sources and thus enable investigations of the effect of the surface chemistry on bone response.
Bibliographical noteFunding Information:
This research was supported by the research grants of the Biotechnology development project (2009-0084195) from the Ministry of Education, Science and Technology of Korea , the VR Foundation , Hjalmar Svensson Research Foundation and Sylvans Foundation . Conflict of interest: The authors have no conflict of interest regarding the subject matter of this manuscript.
- Metal plasma immersion ion implantation and deposition (MePIIID)
- Surface chemistry and topography
- Titanium implant