Abstract
Zn1-xMnxO films with smooth surfaces were prepared Si(100) substrates by reactive cosputtering of high-purity Mn and ZnO targets in an oxygen ambient with partial pressures ranging from 2.2 × 10 -7 to 1.2 × 10-5 Torr. The film deposited at an oxygen partial pressure of 2.2 × 10-7 Torr exhibited a ferromagnetic behavior with a Curie temperature above 350 K while the films for oxygen partial pressures higher than 1.2 × 10-6 Torr revealed nonmagnetic properties. Our results evidently show that the oxygen vacancy plays an important role in the magnetic ordering of Mn-doped ZnO film. Our experimental results show the possibility for applications of Mn-doped ZnO-based tunneling devices.
Original language | English |
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Pages (from-to) | 1029-1033 |
Number of pages | 5 |
Journal | Journal of the Korean Physical Society |
Volume | 49 |
Issue number | 3 |
State | Published - Sep 2006 |
Keywords
- Magnetic impurity interactions
- Magnetic semiconductor