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Low-temperature SiON films deposited by plasma-enhanced atomic layer deposition method using activated silicon precursor
Sungin Suh, Seung Wook Ryu, Seongjae Cho, Jun Rae Kim, Seongkyung Kim, Cheol Seong Hwang, Hyeong Joon Kim
Research output: Contribution to journal › Article › peer-review
22
Scopus
citations