Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT

N. T. Goodfriend, S. V. Starinskiy, O. A. Nerushev, N. M. Bulgakova, A. V. Bulgakov, E. E.B. Campbell

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18 Scopus citations


The influence of the laser pulse duration on the mechanism of blister formation in the particle transfer technique, blister-based laser-induced forward transfer, was investigated. Pulses from a fs Ti:Sapphire laser (120 fs, 800 nm) and from a ns Nd:YAG laser (7 ns, 532 nm) were used to directly compare blister formation on thin titanium films of ca. 300 nm thickness, deposited on glass. The different blister morphologies were compared and contrasted by using optical microscopy and atomic force microscopy. The results provide evidence for different blister formation mechanisms: for fs pulses the mechanism is predominantly ablation at the metal–glass interface accompanied by confined plasma expansion and deformation of the remaining metal film; for ns pulses it is heating accompanied by thermal expansion of the metal film.

Original languageEnglish
Article number154
Pages (from-to)1-9
Number of pages9
JournalApplied Physics A: Materials Science and Processing
Issue number3
StatePublished - 1 Mar 2016

Bibliographical note

Funding Information:
Financial support from the EU via Marie Curie International Incoming Fellowship Grant No. 302991 and from the Leverhulme Trust (RPG 248) is gratefully acknowledged. SVS, NMB and AVB acknowledge support from the Russian Foundation for Basic Research (Project No. 15-08-06591). NMB acknowledges support of the state budget of the Czech Republic (project HiLASE: Superlasers for the real world: LO1602). EEBC acknowledges the hospitality and financial support from JILA in the form of a Visiting Fellowship.

Publisher Copyright:
© 2016, The Author(s).


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