Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses

H. Varel; D. Ashkenasi; A. Rosenfeld; R. Herrmann; F. Noack; E. E.B. Campbell

doi:10.1007/BF01575098

Laser-induced damage in SiO₂ and CaF₂ with picosecond and femtosecond laser pulses

H. Varel, D. Ashkenasi, A. Rosenfeld, R. Herrmann, F. Noack, E. E.B. Campbell

Department of Physics

Research output: Contribution to journal › Article › peer-review

113 Scopus citations

Abstract

Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF₂ are reported for 790 nm photons as a function of laser pulse width (190 fs - 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.

Original language	English
Pages (from-to)	293-294
Number of pages	2
Journal	Applied Physics A: Materials Science and Processing
Volume	62
Issue number	3
DOIs	https://doi.org/10.1007/BF01575098
State	Published - Mar 1996

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abstract = "Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF2 are reported for 790 nm photons as a function of laser pulse width (190 fs - 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.",

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AU - Herrmann, R.

AU - Noack, F.

AU - Campbell, E. E.B.

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AB - Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF2 are reported for 790 nm photons as a function of laser pulse width (190 fs - 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.

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Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses

Abstract

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Laser-induced damage in SiO₂ and CaF₂ with picosecond and femtosecond laser pulses