Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses

H. Varel; D. Ashkenasi; A. Rosenfeld; R. Herrmann; F. Noack; E. E.B. Campbell

doi:10.1007/BF01575098

Laser-induced damage in SiO₂ and CaF₂ with picosecond and femtosecond laser pulses

H. Varel, D. Ashkenasi, A. Rosenfeld, R. Herrmann, F. Noack, E. E.B. Campbell

Department of Physics

Research output: Contribution to journal › Article › peer-review

113 Scopus citations

Abstract

Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF₂ are reported for 790 nm photons as a function of laser pulse width (190 fs - 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.

Original language	English
Pages (from-to)	293-294
Number of pages	2
Journal	Applied Physics A: Materials Science and Processing
Volume	62
Issue number	3
DOIs	https://doi.org/10.1007/BF01575098
State	Published - Mar 1996

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@article{7c822f4d990943c4960c2f389b985f71,

title = "Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses",

abstract = "Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF2 are reported for 790 nm photons as a function of laser pulse width (190 fs - 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.",

author = "H. Varel and D. Ashkenasi and A. Rosenfeld and R. Herrmann and F. Noack and Campbell, {E. E.B.}",

year = "1996",

month = mar,

doi = "10.1007/BF01575098",

language = "English",

volume = "62",

pages = "293--294",

journal = "Applied Physics A: Materials Science and Processing",

issn = "0947-8396",

publisher = "Springer Heidelberg",

number = "3",

}

TY - JOUR

T1 - Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses

AU - Varel, H.

AU - Ashkenasi, D.

AU - Rosenfeld, A.

AU - Herrmann, R.

AU - Noack, F.

AU - Campbell, E. E.B.

PY - 1996/3

Y1 - 1996/3

N2 - Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF2 are reported for 790 nm photons as a function of laser pulse width (190 fs - 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.

AB - Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF2 are reported for 790 nm photons as a function of laser pulse width (190 fs - 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.

UR - http://www.scopus.com/inward/record.url?scp=0030110262&partnerID=8YFLogxK

U2 - 10.1007/BF01575098

DO - 10.1007/BF01575098

M3 - Article

AN - SCOPUS:0030110262

SN - 0947-8396

VL - 62

SP - 293

EP - 294

JO - Applied Physics A: Materials Science and Processing

JF - Applied Physics A: Materials Science and Processing

IS - 3

ER -

Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses

Abstract

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Laser-induced damage in SiO₂ and CaF₂ with picosecond and femtosecond laser pulses