Laser-induced damage in SiO2 and CaF2 with picosecond and femtosecond laser pulses

H. Varel, D. Ashkenasi, A. Rosenfeld, R. Herrmann, F. Noack, E. E.B. Campbell

Research output: Contribution to journalArticlepeer-review

108 Scopus citations

Abstract

Single- and multiple-shot damage thresholds and plasma-emission thresholds for fused silica and CaF2 are reported for 790 nm photons as a function of laser pulse width (190 fs - 4.5 ps). The results are compared with single-shot plasma-emission measurements [1] and with multiple-shot damage measurements [2]. Both the damage threshold and the plasma-emission threshold are shown to decrease with decreasing pulse width over the entire pulse-width range investigated.

Original languageEnglish
Pages (from-to)293-294
Number of pages2
JournalApplied Physics A: Materials Science and Processing
Volume62
Issue number3
DOIs
StatePublished - Mar 1996

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