Large-scale patterning by the roll-based evaporation-induced self-assembly

Won Kyu Park; Taeyoung Kim; Hyeongkeun Kim; Yena Kim; Tran Thanh Tung; Zhiqun Lin; A. Rang Jang; Hyeon Suk Shin; Jong Hun Han; Dae Ho Yoon; Woo Seok Yang

doi:10.1039/c2jm34212j

Large-scale patterning by the roll-based evaporation-induced self-assembly

Won Kyu Park, Taeyoung Kim, Hyeongkeun Kim, Yena Kim, Tran Thanh Tung, Zhiqun Lin, A. Rang Jang, Hyeon Suk Shin, Jong Hun Han, Dae Ho Yoon, Woo Seok Yang

Department of Chemistry & Nanoscience

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

The large-scale fabrication of highly regular polymer stripes was achieved either on rigid or flexible substrates via the roll-based evaporation-induced self-assembly (EISA) method. A control of stripe size was rendered by an adjustment of the jig speed and the polymer concentration. Large-scale graphene stripes on a flexible substrate were also crafted by capitalizing on an optimized condition of the roll-based EISA technique.

Original language	English
Pages (from-to)	22844-22847
Number of pages	4
Journal	Journal of Materials Chemistry
Volume	22
Issue number	43
DOIs	https://doi.org/10.1039/c2jm34212j
State	Published - 21 Nov 2012

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@article{d8649e81334c4d669030da70ecb7af28,

title = "Large-scale patterning by the roll-based evaporation-induced self-assembly",

abstract = "The large-scale fabrication of highly regular polymer stripes was achieved either on rigid or flexible substrates via the roll-based evaporation-induced self-assembly (EISA) method. A control of stripe size was rendered by an adjustment of the jig speed and the polymer concentration. Large-scale graphene stripes on a flexible substrate were also crafted by capitalizing on an optimized condition of the roll-based EISA technique.",

author = "Park, \{Won Kyu\} and Taeyoung Kim and Hyeongkeun Kim and Yena Kim and Tung, \{Tran Thanh\} and Zhiqun Lin and Jang, \{A. Rang\} and Shin, \{Hyeon Suk\} and Han, \{Jong Hun\} and Yoon, \{Dae Ho\} and Yang, \{Woo Seok\}",

year = "2012",

month = nov,

day = "21",

doi = "10.1039/c2jm34212j",

language = "English",

volume = "22",

pages = "22844--22847",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

publisher = "Royal Society of Chemistry",

number = "43",

}

TY - JOUR

T1 - Large-scale patterning by the roll-based evaporation-induced self-assembly

AU - Park, Won Kyu

AU - Kim, Taeyoung

AU - Kim, Hyeongkeun

AU - Kim, Yena

AU - Tung, Tran Thanh

AU - Lin, Zhiqun

AU - Jang, A. Rang

AU - Shin, Hyeon Suk

AU - Han, Jong Hun

AU - Yoon, Dae Ho

AU - Yang, Woo Seok

PY - 2012/11/21

Y1 - 2012/11/21

N2 - The large-scale fabrication of highly regular polymer stripes was achieved either on rigid or flexible substrates via the roll-based evaporation-induced self-assembly (EISA) method. A control of stripe size was rendered by an adjustment of the jig speed and the polymer concentration. Large-scale graphene stripes on a flexible substrate were also crafted by capitalizing on an optimized condition of the roll-based EISA technique.

AB - The large-scale fabrication of highly regular polymer stripes was achieved either on rigid or flexible substrates via the roll-based evaporation-induced self-assembly (EISA) method. A control of stripe size was rendered by an adjustment of the jig speed and the polymer concentration. Large-scale graphene stripes on a flexible substrate were also crafted by capitalizing on an optimized condition of the roll-based EISA technique.

UR - https://www.scopus.com/pages/publications/84867519601

U2 - 10.1039/c2jm34212j

DO - 10.1039/c2jm34212j

M3 - Article

AN - SCOPUS:84867519601

SN - 0959-9428

VL - 22

SP - 22844

EP - 22847

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

IS - 43

ER -

Large-scale patterning by the roll-based evaporation-induced self-assembly

Abstract

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