Large-scale patterning by the roll-based evaporation-induced self-assembly

Won Kyu Park; Taeyoung Kim; Hyeongkeun Kim; Yena Kim; Tran Thanh Tung; Zhiqun Lin; A. Rang Jang; Hyeon Suk Shin; Jong Hun Han; Dae Ho Yoon; Woo Seok Yang

doi:10.1039/c2jm34212j

Large-scale patterning by the roll-based evaporation-induced self-assembly

Won Kyu Park
, Taeyoung Kim
, Hyeongkeun Kim
, Yena Kim
, Tran Thanh Tung
, Zhiqun Lin
, A. Rang Jang
, Hyeon Suk Shin
, Jong Hun Han
, Dae Ho Yoon
, Woo Seok Yang

Department of Chemistry & Nanoscience

Research output: Contribution to journal › Article › peer-review

19 Scopus citations

Abstract

The large-scale fabrication of highly regular polymer stripes was achieved either on rigid or flexible substrates via the roll-based evaporation-induced self-assembly (EISA) method. A control of stripe size was rendered by an adjustment of the jig speed and the polymer concentration. Large-scale graphene stripes on a flexible substrate were also crafted by capitalizing on an optimized condition of the roll-based EISA technique.

Original language	English
Pages (from-to)	22844-22847
Number of pages	4
Journal	Journal of Materials Chemistry
Volume	22
Issue number	43
DOIs	https://doi.org/10.1039/c2jm34212j
State	Published - 21 Nov 2012

Access to Document

10.1039/c2jm34212j

Cite this

@article{d8649e81334c4d669030da70ecb7af28,

title = "Large-scale patterning by the roll-based evaporation-induced self-assembly",

abstract = "The large-scale fabrication of highly regular polymer stripes was achieved either on rigid or flexible substrates via the roll-based evaporation-induced self-assembly (EISA) method. A control of stripe size was rendered by an adjustment of the jig speed and the polymer concentration. Large-scale graphene stripes on a flexible substrate were also crafted by capitalizing on an optimized condition of the roll-based EISA technique.",

author = "Park, \{Won Kyu\} and Taeyoung Kim and Hyeongkeun Kim and Yena Kim and Tung, \{Tran Thanh\} and Zhiqun Lin and Jang, \{A. Rang\} and Shin, \{Hyeon Suk\} and Han, \{Jong Hun\} and Yoon, \{Dae Ho\} and Yang, \{Woo Seok\}",

year = "2012",

month = nov,

day = "21",

doi = "10.1039/c2jm34212j",

language = "English",

volume = "22",

pages = "22844--22847",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

publisher = "Royal Society of Chemistry",

number = "43",

}

TY - JOUR

T1 - Large-scale patterning by the roll-based evaporation-induced self-assembly

AU - Park, Won Kyu

AU - Kim, Taeyoung

AU - Kim, Hyeongkeun

AU - Kim, Yena

AU - Tung, Tran Thanh

AU - Lin, Zhiqun

AU - Jang, A. Rang

AU - Shin, Hyeon Suk

AU - Han, Jong Hun

AU - Yoon, Dae Ho

AU - Yang, Woo Seok

PY - 2012/11/21

Y1 - 2012/11/21

N2 - The large-scale fabrication of highly regular polymer stripes was achieved either on rigid or flexible substrates via the roll-based evaporation-induced self-assembly (EISA) method. A control of stripe size was rendered by an adjustment of the jig speed and the polymer concentration. Large-scale graphene stripes on a flexible substrate were also crafted by capitalizing on an optimized condition of the roll-based EISA technique.

AB - The large-scale fabrication of highly regular polymer stripes was achieved either on rigid or flexible substrates via the roll-based evaporation-induced self-assembly (EISA) method. A control of stripe size was rendered by an adjustment of the jig speed and the polymer concentration. Large-scale graphene stripes on a flexible substrate were also crafted by capitalizing on an optimized condition of the roll-based EISA technique.

UR - https://www.scopus.com/pages/publications/84867519601

U2 - 10.1039/c2jm34212j

DO - 10.1039/c2jm34212j

M3 - Article

AN - SCOPUS:84867519601

SN - 0959-9428

VL - 22

SP - 22844

EP - 22847

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

IS - 43

ER -

Large-scale patterning by the roll-based evaporation-induced self-assembly

Abstract

Access to Document

Fingerprint

Cite this