Large scale MoS₂ nanosheet logic circuits integrated by photolithography on glass

We demonstrate 500 x 500 μm² large scale polygrain MoS₂ nanosheets and field effect transistor (FET) circuits integrated using those nanosheets, which are initially grown on SiO₂/p⁺-Si by chemical vapor deposition but transferred onto glass substrate to be patterned by photolithography. In fact, large scale growth of two-dimensional MoS₂ and its conventional way of patterning for integrated devices have remained as one of the unresolved important issues. In the present study, we achieved maximum linear mobility of ∼9 cm² V^-1 s^-1 from single-domain MoS₂ FET on SiO₂/p⁺-Si substrate and 0.5-3.0 cm² V^-1 s^-1 from large scale MoS₂ sheet transferred onto glass. Such reduced mobility is attributed to the transfer process-induced wrinkles and crevices, domain boundaries, residue on MoS₂, and loss of the back gate-charging effects that might exist due to SiO₂/p⁺-Si substrate. Among 16 MoS₂-based FETs, 13 devices successfully work (yield was more than 80%) producing NOT, NOR, and NAND logic circuits. Inverter (NOT gate) shows quite a high voltage gain over 12 at a supply voltage of 5 V, also displaying 60 μs switching speed in kilohertz dynamics.