Kinetics and degradation mechanism of clofibric acid and diclofenac in UV photolysis and UV/H2O2reaction

In Young Kim; Moon Kyung Kim; Yeomin Yoon; Jong Kwon Im; Kyung Duk Zoh

doi:10.1080/19443994.2013.817507

Kinetics and degradation mechanism of clofibric acid and diclofenac in UV photolysis and UV/H₂O₂reaction

In Young Kim, Moon Kyung Kim, Yeomin Yoon, Jong Kwon Im, Kyung Duk Zoh

Department of Environmental Science & Engineering

Research output: Contribution to journal › Article › peer-review

29 Scopus citations

Abstract

In this study, we investigated the removal of the selected pharmaceuticals, clofibric acid and diclofenac, using UV photolysis and UV/H₂O₂reactions. The degradation of diclofenac during UV photolysis reaction was faster than that of clofibric acid. Diclofenac was mainly removed by photolysis reaction; clofibric acid was more sensitive to OH radical. More effective removals of clofibric acid and diclofenac were observed when H₂O₂was added in the UV photolysis reaction. The competition kinetics showed that the second-order rate constant between the OH radical and the pharmaceuticals was 5.57 × 10⁹M⁻¹s⁻¹for clofibric acid and 2.45 × 10⁹M⁻¹s⁻¹for diclofenac, respectively. The major reaction intermediates during the UV photolysis and UV/H₂O₂reactions of clofibric acid were 4-chlorophenol and hydroquinone, and these intermediates were degraded as phenol with further reaction.

Original language	English
Pages (from-to)	6211-6218
Number of pages	8
Journal	Desalination and Water Treatment
Volume	52
Issue number	31-33
DOIs	https://doi.org/10.1080/19443994.2013.817507
State	Published - Sep 2014

Bibliographical note

Publisher Copyright:
© 2013 Balaban Desalination Publications. All rights reserved.

Keywords

Competition kinetics
Hydroquinone
Mineralization
OH radical
Phenol

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10.1080/19443994.2013.817507

Cite this

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title = "Kinetics and degradation mechanism of clofibric acid and diclofenac in UV photolysis and UV/H2O2reaction",

abstract = "In this study, we investigated the removal of the selected pharmaceuticals, clofibric acid and diclofenac, using UV photolysis and UV/H2O2reactions. The degradation of diclofenac during UV photolysis reaction was faster than that of clofibric acid. Diclofenac was mainly removed by photolysis reaction; clofibric acid was more sensitive to OH radical. More effective removals of clofibric acid and diclofenac were observed when H2O2was added in the UV photolysis reaction. The competition kinetics showed that the second-order rate constant between the OH radical and the pharmaceuticals was 5.57 × 109M−1s−1for clofibric acid and 2.45 × 109M−1s−1for diclofenac, respectively. The major reaction intermediates during the UV photolysis and UV/H2O2reactions of clofibric acid were 4-chlorophenol and hydroquinone, and these intermediates were degraded as phenol with further reaction.",

keywords = "Competition kinetics, Hydroquinone, Mineralization, OH radical, Phenol",

author = "Kim, {In Young} and Kim, {Moon Kyung} and Yeomin Yoon and Im, {Jong Kwon} and Zoh, {Kyung Duk}",

year = "2014",

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AU - Kim, In Young

AU - Kim, Moon Kyung

AU - Yoon, Yeomin

AU - Im, Jong Kwon

AU - Zoh, Kyung Duk

PY - 2014/9

Y1 - 2014/9

N2 - In this study, we investigated the removal of the selected pharmaceuticals, clofibric acid and diclofenac, using UV photolysis and UV/H2O2reactions. The degradation of diclofenac during UV photolysis reaction was faster than that of clofibric acid. Diclofenac was mainly removed by photolysis reaction; clofibric acid was more sensitive to OH radical. More effective removals of clofibric acid and diclofenac were observed when H2O2was added in the UV photolysis reaction. The competition kinetics showed that the second-order rate constant between the OH radical and the pharmaceuticals was 5.57 × 109M−1s−1for clofibric acid and 2.45 × 109M−1s−1for diclofenac, respectively. The major reaction intermediates during the UV photolysis and UV/H2O2reactions of clofibric acid were 4-chlorophenol and hydroquinone, and these intermediates were degraded as phenol with further reaction.

AB - In this study, we investigated the removal of the selected pharmaceuticals, clofibric acid and diclofenac, using UV photolysis and UV/H2O2reactions. The degradation of diclofenac during UV photolysis reaction was faster than that of clofibric acid. Diclofenac was mainly removed by photolysis reaction; clofibric acid was more sensitive to OH radical. More effective removals of clofibric acid and diclofenac were observed when H2O2was added in the UV photolysis reaction. The competition kinetics showed that the second-order rate constant between the OH radical and the pharmaceuticals was 5.57 × 109M−1s−1for clofibric acid and 2.45 × 109M−1s−1for diclofenac, respectively. The major reaction intermediates during the UV photolysis and UV/H2O2reactions of clofibric acid were 4-chlorophenol and hydroquinone, and these intermediates were degraded as phenol with further reaction.

KW - Competition kinetics

KW - Hydroquinone

KW - Mineralization

KW - OH radical

KW - Phenol

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